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Volumn 42, Issue 15, 2013, Pages 5554-5565
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CVD of pure copper films from novel iso-ureate complexes
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Author keywords
[No Author keywords available]
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Indexed keywords
ENERGY DISPERSIVE X RAY SPECTROSCOPY;
LOW PRESSURE CHEMICAL VAPOUR DEPOSITIONS;
METAL PRECURSOR;
METALLIC COPPER;
POWDER X-RAY DIFFRACTION (PXRD);
SINGLE CRYSTAL X-RAY DIFFRACTION ANALYSIS;
SUBSTRATE TEMPERATURE;
TEMPERATURE DEPENDENT;
CHELATION;
COPPER;
COPPER METALLURGY;
PHOTOELECTRONS;
SUBSTRATES;
THERMOGRAVIMETRIC ANALYSIS;
THIN FILMS;
X RAY DIFFRACTION ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
X RAY SPECTROSCOPY;
COPPER COMPOUNDS;
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EID: 84875449924
PISSN: 14779226
EISSN: 14779234
Source Type: Journal
DOI: 10.1039/c3dt00104k Document Type: Article |
Times cited : (7)
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References (89)
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