Comparison of (hexafluoroacetylacetonate)Cu(vinyltrimethylsilane) and (hexafluoroacetylacetonate)Cu(allyltrimethylsilane) for metalorganic chemical vapor deposition of copper

Journal of Materials Research

Volumn 14, Issue 3, 1999, Pages 975-979

  Park, Man Young ^a   Son, Jong Hoon ^a   Kang, Sang Woo ^a   Rhee, Shi Woo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BOND STRENGTH (CHEMICAL); COPPER COMPOUNDS; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAIN SIZE AND SHAPE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; MOLECULAR STRUCTURE; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; THERMODYNAMIC STABILITY;

DISPROPORTION REACTIONS;

COPPER;

EID: 0033097618     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0129     Document Type: Article

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