Fluorinated aminoalkoxide CuII complexes: New CVD precursors for deposition of copper metal

Journal of Materials Chemistry

Volumn 12, Issue 12, 2002, Pages 3541-3550

  Chi, Yun ^a   Hsu, Peng Fu ^a   Liu, Chao Shiuan ^a   Ching, Wei Li ^a   Chou, Tsung Yi ^a   Carty, Arthur J ^b   Peng, Shie Ming ^c   Lee, Gene Hsiang ^c   Chuang, Shiow Huey ^d  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^c NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^d NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMINE; AMINO ACID; ARGON; COPPER COMPLEX; FLUORINE; LIGAND; METAL COMPLEX; OXIDE; OXYGEN; REAGENT;

ARTICLE; ATOM; CHEMICAL BOND; CRYSTAL STRUCTURE; FLUORINATION; GEOMETRY; MELTING POINT; MOLECULAR DYNAMICS; MOLECULAR WEIGHT; SPECTROSCOPY; STRUCTURE ANALYSIS; SYNTHESIS; TEMPERATURE; X RAY CRYSTALLOGRAPHY; X RAY DIFFRACTION;

EID: 0036939671     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/b205419a     Document Type: Article

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