Effect of sputtering power on the properties of ZnO:Ga transparent conductive oxide films deposited by pulsed DC magnetron sputtering with a rotating cylindrical target

Applied Surface Science

Volumn 271, Issue , 2013, Pages 216-222

  Ahn, Kyung Jun ^a   Park, Ji Hyeon ^b   Shin, Beom Ki ^b   Lee, Woong ^c   Yeom, Geun Young ^a   Myoung, Jae Min ^b  

^a Sungkyunkwan University   (South Korea)

^b Yonsei University   (South Korea)

^c Changwon National University   (South Korea)

Author keywords

Ga doped ZnO; Pulsed DC magnetron sputtering; Transparent conductive oxide

Indexed keywords

CONDUCTIVE FILMS; GALLIUM COMPOUNDS; HALL MOBILITY; II-VI SEMICONDUCTORS; MAGNETRON SPUTTERING; ZINC OXIDE;

COLUMNAR GRAIN; GA-DOPED ZNO; POROUS SURFACE; PULSED DC MAGNETRON SPUTTERING; ROTATING CYLINDRICAL TARGETS; SPUTTERING POWER; TRANSPARENT CONDUCTIVE OXIDE FILMS; TRANSPARENT CONDUCTIVE OXIDES;

OXIDE FILMS;

EID: 84875368435     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.01.163     Document Type: Article

References (31)

1. 2 Physical Review B 66 2002 352031 352038
2. K. Nomura, H. Ohta, K. Ueda, T. Kamiya, M. Hirano, and H. Hosono Thin-film transistor fabricated in single-crystalline transparent oxide semiconductor Science 300 2003 1269 1272
3. X. Nie, S.-H. Wei, and S. Zhang Bipolar doping and band-gap anomalies in delafossite transparent conductive oxides Physical Review Letters 88 2002 0664051 0664054
4. H. Hosono, H. Ohta, M. Orita, K. Ueda, and M. Hirano Frontier of transparent conductive oxide thin films Vacuum 66 2002 419 425
5. K. Suzuki, N. Hashimoto, T. Oyama, J. Shimizu, Y. Akao, and H. Kojima Large scale and low resistance ITO films formed at high deposition rates Thin Solid Films 226 1993 104 109
6. T. Minami Present status of transparent conducting oxide thin-film development for indium-tin-oxide (ITO) substitutes Thin Solid Films 516 2008 5822 5828
7. A. Mondal, N. Mukherjee, and S.K. Bhar Galvanic deposition of hexagonal ZnO thin films on TCO glass substrate Materials Letters 60 2006 1748 1752
8. M. Purica, E. Budianu, E. Rusu, M. Danila, and R. Gavrila Optical and structural investigation of ZnO thin films prepared by chemical vapor deposition (CVD) Thin Solid Films 403 2002 485 488
9. J. Sans, J. Sánchez-Royo, A. Segura, G. Tobias, and E. Canadell Chemical effects on the optical band-gap of heavily doped ZnO:MIII (M = Al,Ga,In): an investigation by means of photoelectron spectroscopy, optical measurements under pressure, and band structure calculations Physical Review B 79 2009 1951051 1951059
10. B.Y. Oh, M.C. Jeong, and J.M. Myoung Stabilization in electrical characteristics of hydrogen-annealed ZnO:Al films Applied Surface Science 253 2007 7157 7161
11. J.-H. Park, B.-K. Shin, H.-M. Moon, M.-J. Lee, K.-I. Park, K.-J. Ahn, W. Lee, and J.-M. Myoung Effect of the substrate temperature on the properties of Ga-doped ZnO films for photovoltaic cell applications deposited by a pulsed DC magnetron sputtering with a rotating cylindrical target Vacuum 86 2012 1423 1427
12. X. Yu, J. Ma, F. Ji, Y. Wang, X. Zhang, C. Cheng, and H. Ma Effects of sputtering power on the properties of ZnO:Ga films deposited by r.f. magnetron-sputtering at low temperature Journal of Crystal Growth 274 2005 474 479
13. K. Chopra, S. Major, and D. Pandya Transparent conductors-a status review Thin Solid Films 102 1983 1 46
14. K. Ellmer Magnetron sputtering of transparent conductive zinc oxide: relation between the sputtering parameters and the electronic properties Journal of Physics D: Applied Physics 33 2000 R17 R32
15. B.-K. Shin, T.-I. Lee, J. Prakash Kar, M.-J. Lee, K.-I. Park, K.-J. Ahn, K.-Y. Yeom, J.-H. Cho, and J.-M. Myoung Effect of deposition power on structural and electrical properties of Al-doped ZnO films using pulsed direct-current magnetron sputtering with single cylindrical target Materials Science in Semiconductor Processing 14 2011 23 27
16. J. Musil, P. Baroch, J. Vlček, K.H. Nam, and J.G. Han Reactive magnetron sputtering of thin films: present status and trends Thin Solid Films 475 2005 208 218
17. I. Brodie, L. Lamont, and R. Jepsen Production of high-energy neutral atoms by scattering of ions at solid surfaces and its relation to sputtering Physical Review Letters 21 1968 1224 1226
18. X.Y. Li, D. Depla, W.P. Leroy, J. Haemers, and R. De Gryse Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering Journal of Physics D: Applied Physics 41 2008 0352031 0352036
19. J. Musschoot, D. Depla, G. Buyle, J. Haemers, and R.D. Gryse Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: a Monte Carlo simulation Journal of Physics D: Applied Physics 39 2006 3989 3993
20. D.G. Lim, D.H. Kim, J.K. Kim, O. Kwon, K.J. Yang, K.I. Park, B.S. Kim, S.W. Lee, M.W. Park, and D.J. Kwak Improved electrical properties of ZnO:Al transparent conducting oxide films using a substrate bias Superlattices and Microstructures 39 2006 107 114
21. R. Mientus, and K. Ellmer Reactive magnetron sputtering of tin-doped indium oxide (ITO): influence of argon pressure and plasma excitation mode Surface and Coatings Technology 142 2001 748 754
22. 2 ambient annealing in fully 0 0 2-textured ZnO:Ga thin films grown on glass substrates using RF magnetron co-sputter deposition Applied Surface Science 255 2009 4616 4622
23. Q.-B. Ma, Z.-Z. Ye, H.-P. He, J.-R. Wang, L.-P. Zhu, and B.-H. Zhao Preparation and characterization of transparent conductive ZnO:Ga films by DC reactive magnetron sputtering Materials Characterization 59 2008 124 128
24. X. Sun, and H. Kwok Optical properties of epitaxially grown zinc oxide films on sapphire by pulsed laser deposition Journal of Applied Physics 86 1999 408 411
25. A. Patterson The Scherrer formula for X-ray particle size determination Physical Review 56 1939 978 982
26. R. Viswanatha, S. Sapra, S.S. Gupta, B. Satpati, P. Satyam, B. Dev, and D. Sarma Synthesis and characterization of Mn-doped ZnO nanocrystals Journal of Physical Chemistry B 108 2004 6303 6310
27. 2 thin film cathodes for thin film microbattery Materials Chemistry and Physics 93 2005 70 78
28. S. Lee, D. Cheon, W.-J. Kim, M.-H. Ham, and W. Lee Ga-doped ZnO films deposited with varying sputtering powers and substrate temperatures by pulsed DC magnetron sputtering and their property improvement potentials Applied Surface Science 258 2012 6537 6544
29. S.-S. Lin, J.-L. Huang, and P. Šajgalik The properties of Ti-doped ZnO films deposited by simultaneous RF and DC magnetron sputtering Surface and Coatings Technology 191 2005 286 292
30. J.-P. Lin, S.-W. Chen, and J.-M. Wu Influence of nanocrystalline grains on electronic conduction in sol-gel derived Al-doped ZnO films Electrochemical and Solid State Letters 12 2009 J1 J4
31. 2 thin film structure Journal of Physics D: Applied Physics 42 2009 1354021 1354029