Effects of sputtering power on the properties of ZnO:Ga films deposited by r.f. magnetron-sputtering at low temperature

Journal of Crystal Growth

Volumn 274, Issue 3-4, 2005, Pages 474-479

  Yu, Xuhu ^a   Ma, Jin ^a   Ji, Feng ^a   Wang, Yuheng ^a   Zhang, Xijian ^a   Cheng, Chuanfu ^b   Ma, Honglei ^a  

^a SHANDONG UNIVERSITY   (China)

^b SHANDONG NORMAL UNIVERSITY   (China)

Author keywords

A3. Magnetron sputtering; A3. ZnO:Ga films; B2. Electrical and optical properties

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTALLOGRAPHY; DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; GLASS; LOW TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; MOLECULAR BEAM EPITAXY; OPTICAL PROPERTIES; POLYCRYSTALLINE MATERIALS; RADIATION; SOL-GELS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

ANO:GA FILMS; GLASS SUBSTRATES; SHEET RESISTANCES; WURTZITE STRUCTURES;

ZINC OXIDE;

EID: 12344308342     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.10.037     Document Type: Article

References (19)

1. S. Kohiki, M. Nishitani, and T. Wada J. Appl. Phys. 75 1994 2069
2. T. Minami, H. Sato, H. Nanto, and S. Takata Jpn.J. Appl. Phys. 24 1985 L781
3. J.F. Chang, H.L. Wang, and M.H. Hon J. Crystal Growth 211 2000 93
4. Ma. Jin, Ji. Feng, Zhang. De-Heng, Ma. Hong-lei, and Li. Shu-Ying Thin Solid Films 357 1999 98
5. C. Kittel Introduction to Solid State Physics Sixth ed 1986 Wiley New York p.76
6. H.J. Ko, Y.F. Chen, S.K. Hong, H. Wenisch, T. Yao, D.C. Look J. Hu, and R.G. Gordon J. Appl. Phys. 72 1992 5381
7. J. Hu, and R.G. Gordon J. Appl. Phys. 72 1992 5381
8. K.Y. Cheong, N. Muti, and S. Roy Ramanan Thin Solid Films 410 2002 142
9. K.T. Ramakrishna Reddy, H. Gopalaswamy, P.J. Reddy, and R.W. Miles J. Crystal Growth 210 2000 516
10. V. Assunção, E. Fortunato, A. Marques, H. Águas, I. Ferreira, M.E.V. Costa, and R. Martins Thin Solid Films 427 2003 401
11. G.A. Hirata, J. McKittrick, T. Cheeks, J.M. Siqueiros, J.A. Diaz, O. Contreras, and O.A. Lopez Thin Solid Films 288 1996 29
12. H. Kato, M. Sano, K. Miyamoto, and T. Yao J. Crystal Growth 237-239 2002 538
13. T. Minami, S. Ida, and T. Miyata Thin Solid Films 416 2002 92
14. Xiaotao Hao,Jin Ma, Deheng Zhang, Tianlin Yang, Honglei Ma, Yingge Yang, Chuanfu Cheng, Jie Huang, Appl. Surf. Sci.183 (2001) 137.
15. Honglei Ma, Xiaotao Hao,Jin Ma, Surf. Coatings Technol. 161 (2002) 58.
16. A. Van der Drift Philips Res. Rep. 22 1967 267
17. B. Callity in: Element of X-ray Diffraction 1959 Addison-Wesley London p.99
18. D.H. Zhang, and H.L. Ma Appl. Phys. A. 62 1996 4
19. B.E. Sernelius, K.-F. Berggren, Z.-C. Jin, I. Hamberg, and C.G. Granqvist Physical Rev. B 37 1988 10244