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Volumn 86, Issue 10, 2012, Pages 1423-1427

Effect of the substrate temperature on the properties of Ga-doped ZnO films for photovoltaic cell applications deposited by a pulsed DC magnetron sputtering with a rotating cylindrical target

(8) Park, Ji Hyeon a Shin, Beom Ki a Moon, Hong Man a Lee, Min Jung a Park, Kang Il b Ahn, Kyung Jun b Lee, Woong c Myoung, Jae Min a

a Yonsei University (South Korea)

b SNTEK Co Ltd (South Korea)

c Changwon National University (South Korea)

Author keywords

Anti reflection coating; Ga doped ZnO (GZO); Rotating cylindrical target; Solar cell; Surface texturing

Indexed keywords

CYLINDRICAL TARGET; DENSE COLUMNAR STRUCTURES; DEPOSITION TEMPERATURES; DIFFUSE SURFACES; DOPING EFFICIENCY; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL RESISTIVITY; GA-DOPED ZNO; MIXED ORIENTATIONS; MORPHOLOGICAL EVOLUTION; MORPHOLOGICAL FEATURES; NOVEL TECHNIQUES; OXIDE PHASIS; PHOTOVOLTAIC; PROCESS CONDITION; PULSED DC MAGNETRON SPUTTERING; SPECTRAL RANGE; SUBSTRATE TEMPERATURE; SURFACE-TEXTURING;

COATINGS; ELECTRIC CONDUCTIVITY; GALLIUM; GALLIUM ALLOYS; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; PHOTOVOLTAIC CELLS; SEMICONDUCTOR DOPING; SOLAR CELLS; ZINC OXIDE;

PHOTOVOLTAIC EFFECTS;

EID: 84859121140 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/j.vacuum.2012.03.002 Document Type: Conference Paper

Times cited : (23)

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