Improved electrical properties of ZnO:Al transparent conducting oxide films using a substrate bias

Superlattices and Microstructures

Volumn 39, Issue 1-4, 2006, Pages 107-114

  Lim, D G ^a   Kim, D H ^a   Kim, J K ^a   Kwon, O ^a   Yang, K J ^a   Park, K I ^b   Kim, B S ^b   Lee, S W ^b   Park, M W ^b   Kwak, D J ^b  

^a Chungju National University   (South Korea)

^b Kyungsung University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; ZINC OXIDE;

ALUMINIUM DOPED ZINC OXIDE (ZNO:AL) FILMS; DEPOSITION RATE; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 29344450648     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2005.08.077     Document Type: Article

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