Stable p-type ZnO films dual-doped with silver and nitrogen

Solid State Communications

Volumn 157, Issue , 2013, Pages 45-48

  Duan, Li ^a   Zhang, Wenxue ^a   Yu, Xiaochen ^a   Wang, Pei ^a   Jiang, Ziqiang ^a   Luan, Lijun ^a   Chen, Yongnan ^a   Li, Donglin ^a  

^a CHANG'AN UNIVERSITY   (China)

Author keywords

A. Semiconductor; A. ZnO; B. Dual doping; D. p Type

Indexed keywords

B. DUAL-DOPING; C-AXIS ORIENTATIONS; GLASS SUBSTRATES; HIGH TRANSMITTANCE; N-TYPE ZNO; P TYPE ZNO; P-N JUNCTION; P-TYPE; P-TYPE CONDUCTIVITY; P-TYPE ZNO FILM; RECTIFYING BEHAVIORS; ROOM TEMPERATURE; ULTRAVIOLET EMISSION; VISIBLE REGION; ZNO;

ELECTRIC PROPERTIES; METALLIC FILMS; OPTICAL PROPERTIES; SEMICONDUCTOR DOPING; SEMICONDUCTOR JUNCTIONS; SOL-GEL PROCESS; SUBSTRATES; ZINC OXIDE;

SILVER;

EID: 84874178247     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2012.12.029     Document Type: Article

References (32)

1. A. Tsukazaki, A. Ohtomo, T. Onuma, M. Ohtani, T. Makino, M. Sumiya, K. Ohtani, S.F. Chichibu, S. Fuke, Y. Segawa, H. Ohno, H. Koinuma, and M. Kawasak Nat. Mater. 4 2005 42
2. T. Aoki, Y. Hatanaka, and D.C. Look Appl. Phys. Lett. 76 2000 3257
3. D.-H. Lee, K.-H. Park, S. Kim, and S.Y. Lee Thin Solid Films 520 2011 1160
4. F. Sun, C.X. Shana, S.P. Wang, B.H. Li, Z.Z. Zhang, C.L. Yang, and D.Z. Shen Mater. Chem. Phys. 129 2011 27
5. M.A. Zimmler, T. Voss, C. Ronning, and F. Capasso Appl. Phys. Lett. 94 2009 241120
6. U. Ośzguśr, D. Hofstetter, and H. Morkoç Proc. IEEE 98 2010 1255
7. T.M. Barnes, K. Olson, and C.A. Wolden Appl. Phys. Lett. 86 2005 112112
8. L.G. Wang, and A. Zunger Phys. Rev. Lett. 90 2003 256401
9. A. Krtschil, A. Dadgar, N. Oleynik, J. Bläsing, A. Diez, and A. Krost Appl. Phys. Lett. 87 2005 262105
10. Y.C. Cheng, Y.S. Kuo, Y.H. Li, J.J. Shyue, and M.J. Chen Thin Solid Films 519 2011 5558
11. J.G. Lu, Y.Z. Zhang, Z.Z. Ye, L.P. Zhu, L. Wang, B.H. Zhao, and Q.L. Liang Appl. Phys. Lett. 88 2006 222114
12. X.H. Wang, B. Yao, Z.P. Wei, D.Z. Sheng, Z.Z. Zhang, B.H. Li, Y.M. Lu, D.X. Zhao, J.Y. Zhang, X.W. Fan, L.X. Guan, and C.X. Cong J. Phys. D: Appl. Phys. 39 2006 4568
13. E. Tomzig, and R. Helbig J. Lumin. 14 1976 403
14. R.T. Cox, D. Block, A. Herve, R. Picard, and C. Santier Solid State Commun. 25 1978 77
15. J.J. Lander J. Phys. Chem. Sol. 15 1960 324
16. Y. Yan, M.M. Al-Jassim, and S. Wei Appl. Phys. Lett. 89 2006 181912
17. Q. Wan, Z. Xiong, J. Dai, J. Rao, and F. Jiang Opt. Mater. 30 2008 817
18. J. Hu, and B.C. Pan J. Chem. Phys. 129 2008 154706
19. H.S. Kang, B.D. Ahn, J.H. Kim, G.H. Kim, S.H. Lim, H.W. Chang, and S.Y. Lee Appl. Phys. Lett. 88 2006 202108
20. L. Duan, B.X. Lin, W.Y. Zhang, S. Zhong, and Z.X. Fu Appl. Phys. Lett. 88 2006 232110
21. I.S. Kim, E. Jeong, D.Y. Kim, M. Kumar, and S. Choi Appl. Surf. Sci. 255 2009 4011
22. C.Y. Zuo, J. Wen, and Y.L. Bai Chin. Phys. B 19 2010 047101
23. C. Ravichandran, G. Srinivasan, C. Lennon, S. Sivanathan, and J. Kumar Mater. Sci. Semicond. Proc. 13 2010 46
24. S.J. Lim, S. Kwon, H. Kim, and J.S. Park Appl. Phys. Lett. 91 2007 183517
25. N.L. Tarwal, and P.S. Patil Electrochim. Acta 56 2011 6510
26. B. Lin, Z. Fu, and Y. Jia Appl. Phys. Lett. 79 2001 943
27. K. Vanheusdena, C.H. Seagera, W.L. Warrena, D.R. Tallanta, J. Carusob, M.J. Hampden-Smith, and T.T. Kodas Appl. Phys. Lett. 75 1997 11
28. Q. Zhao, X.Y. Xu, X.F. Song, X.Z. Zhang, and D.P. Yua Appl. Phys. Lett. 88 2006 033102
29. H. Nian, S.H. Hahn, K.K. Koo, E.W. Shin, and E.J. Kim Mater. Lett. 63 2009 2246
30. M. Girtan, and G. Folcher Surf. Coat. Technol. 172 2003 242
31. R. Ghosh, D. Basak, and S. Fujihara J. Appl. Phys. 96 2004 2689
32. V. Srikant, and D.R. Clarke J. Appl. Phys. 81 1997 6357