Simple holographic patterning for high-aspect-ratio three-dimensional nanostructures with large coverage area

Advanced Functional Materials

Volumn 23, Issue 5, 2013, Pages 608-618

  Wathuthanthri, Ishan ^a   Liu, Yuyang ^a   Du, Ke ^a   Xu, Wei ^a   Choi, Chang Hwan ^a  

^a Stevens Institute of Technology   (United States)

Author keywords

hierarchical structures; holography; photocatalysis; photonic crystals; photovoltaic devices; polymeric materials; titanium dioxide

Indexed keywords

3D GEOMETRY; 3D PHOTONIC CRYSTALS; COVERAGE AREA; FUNCTIONALIZED MATERIALS; HIERARCHICAL STRUCTURES; HIGH ASPECT RATIO; HOLOGRAPHIC LITHOGRAPHY; INTERCONNECTED PORE NETWORKS; LITHOGRAPHY PROCESS; MULTIBEAMS; OXIDE NANOSTRUCTURES; PATTERN TRANSFER PROCESS; PATTERN TRANSFERS; PHOTORESIST MATERIALS; PHOTOVOLTAIC DEVICES; PHOTOVOLTAIC SOLAR CELLS; POROUS POLYMERS; POTENTIAL APPLICATIONS; SIDEWALL PROFILES; STANDING WAVE; THERMAL DECOMPOSITION PROCESS; THREE-DIMENSIONAL (3D) NANOSTRUCTURES; THREE-DIMENSIONAL NANOSTRUCTURES; TWO BEAMS; WATER DECONTAMINATION;

ASPECT RATIO; DECONTAMINATION; ELASTIC WAVES; ETCHING; FABRICATION; FUNCTIONAL POLYMERS; HOLOGRAPHY; IMAGE RESOLUTION; LITHOGRAPHY; MOLDING; NANOSTRUCTURED MATERIALS; PHOTOCATALYSIS; PHOTOCATALYSTS; PHOTONIC CRYSTALS; PHOTORESISTS; POLYMERS; SOLAR CELLS; THREE DIMENSIONAL; THREE DIMENSIONAL COMPUTER GRAPHICS; TITANIUM; TITANIUM DIOXIDE; WAVEFORM ANALYSIS;

NANOSTRUCTURES;

EID: 84873331286     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.201201814     Document Type: Article

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62. th International Conference on Micro Electro Mechanical Systems, January 29-February 2, 2012, Paris, France.