Tunable two-mirror interference lithography system for wafer-scale nanopatterning

Optics Letters

Volumn 36, Issue 16, 2011, Pages 3176-3178

  Mao, Weidong ^a   Wathuthanthri, Ishan ^a   Choi, Chang Hwan ^a  

^a Stevens Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COHERENCE LENGTHS; COVERAGE AREA; EXPANDED BEAMS; HE-CD LASERS; INTERFERENCE LITHOGRAPHY; MIRROR SIZE; NANO PATTERN; NANOPATTERNING; PATTERN PERIODICITY; TUNABILITIES; TWO-BEAM INTERFERENCE; WAFER LEVEL; WAFER SCALE;

IMAGE RESOLUTION;

MIRRORS;

EID: 80051778891     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.36.003176     Document Type: Article

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