Holographic realization of hexagonal two dimensional photonic crystal structures with elliptical geometry

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 28, Issue 5, 2010, Pages 1030-1038

  Hung, Yung Jr ^a   Lee, San Liang ^a   Pan, Yen Ting ^a   Thibeault, Brian J ^b   Coldren, Larry A ^b  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CHROMIUM; CRYSTAL STRUCTURE; LASER RECORDING; PLASMA ETCHING; REACTIVE ION ETCHING; SILICON ON INSULATOR TECHNOLOGY;

ANTIREFLECTION LAYERS; DEEP REACTIVE ION ETCHING; DIFFERENT PROCESS; HARD MASKS; HIGH ASPECT RATIO; HOLOGRAPHIC PHOTONIC CRYSTALS; LASER HOLOGRAPHY; LIFT-OFF PROCESS; PHOTONIC CRYSTAL TEMPLATES; REPRODUCIBILITIES; SILICON SUBSTRATES; SINGLE-STEP; SUBMICRON; SUBMICRON SCALE; TWO-DIMENSIONAL PHOTONIC CRYSTALS;

PHOTONIC CRYSTALS;

EID: 77957737395     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3491185     Document Type: Article

References (21)

1. E. Yablonovitch, Phys. Rev. Lett. PRLTAO 0031-9007 58, 2059 (1987). 10.1103/PhysRevLett.58.2059
2. S. John, Phys. Rev. Lett. PRLTAO 0031-9007 58, 2486 (1987). 10.1103/PhysRevLett.58.2486
3. Y.-J. Hung, S.-L. Lee, and Y.-T. Pan, J. Opt. JOOPDB 0150-536X 12, 015102 (2010). 10.1088/2040-8978/12/1/015102
4. S. C. Kitson, W. L. Barnes, and J. R. Sambles, IEEE Photonics Technol. Lett. IPTLEL 1041-1135 8, 1662 (1996). 10.1109/68.544711
5. J.-M. Lee, S. H. Oh, C.-W. Lee, H. Ko, S. Park, K. S. Kim, and M.-H. Park, Thin Solid Films THSFAP 0040-6090 475, 189 (2005). 10.1016/j.tsf.2004.08. 055 (Pubitemid 40206313)
6. F. Quiónez, J. W. Menezes, L. Cescato, V. F. Rodriguez-Esquerre, H. Hernandez-Figueroa, and R. D. Mansano, Opt. Express OPEXFF 1094-4087 14, 4873 (2006). 10.1364/OE.14.004873 (Pubitemid 43815022)
7. E. J. Carvalho, M. A. R. Alves, E. S. Braga, and L. Cescato, Microelectron. J. MICEB9 0026-2692 37, 1265 (2006). 10.1016/j.mejo.2006.07.027 (Pubitemid 44692746)
8. N.-D. Lai, W.-P. Liang, J.-H. Lin, C.-C. Hsu, and C.-H. Lin, Opt. Express OPEXFF 1094-4087 13, 9605 (2005). 10.1364/OPEX.13.009605 (Pubitemid 41611995)
9. L. Pang, W. Nakagawa, and Y. Fainman, Appl. Opt. APOPAI 0003-6935 42, 5450 (2003). 10.1364/AO.42.005450
10. L. Vogelaar, W. Nijdam, H. A. G. M. van Wolferen, R. M. de Ridder, F. B. Segerink, E. Flück, L. Kuipers, and N. F. van Hulst, Adv. Mater. ADVMEW 0935-9648 13, 1551 (2001). 10.1002/1521-4095(200110)13:20<1551::AID- ADMA15513.0.CO;2-V
11. H. Misawa, T. Kondo, S. Juodkazis, and V. Mizeikis, Opt. Express OPEXFF 1094-4087 14, 7943 (2006). 10.1364/OE.14.007943 (Pubitemid 44277529)
12. N. D. Lai, W. Liang, J. Lin, and C. Hsu, Opt. Express OPEXFF 1094-4087 13, 5331 (2005). 10.1364/OPEX.13.005331 (Pubitemid 41029287)
13. I. B. Divliansky, A. Shishido, I.-C. Khoo, T. S. Mayer, D. Pena, S. Nishimura, C. D. Keating, and T. E. Mallouk, Appl. Phys. Lett. APPLAB 0003-6951 79, 3392 (2001). 10.1063/1.1420584
14. M. J. Escuti and G. P. Crawford, Opt. Eng. (Bellingham) OPEGAR 0091-3286 43, 1973 (2004). 10.1117/1.1773773
15. C. A. Mack, J. Electrochem. Soc. JESOAN 0013-4651 134, 148 (1987). 10.1149/1.2100396
16. B. A. Mello, I. F. da Costa, C. R. A. Lima, and L. Cescato, Appl. Opt. APOPAI 0003-6935 34, 597 (1995). 10.1364/AO.34.000597
17. A. S. Kewitsch and A. Yariv, Appl. Phys. Lett. APPLAB 0003-6951 68, 455 (1996). 10.1063/1.116411 (Pubitemid 126684400)
18. H. L. Chen, T. C. Chu, M. Y. Li, F. H. Ko, H. C. Cheng, and T. Y. Huang, J. Vac. Sci. Technol. B JVTBD9 1071-1023 19, 2381 (2001). 10.1116/1.1421552 (Pubitemid 34089750)
19. R. R. Dammel and R. A. Norwood, Proc. SPIE PSISDG 0277-786X 2724, 754 (1996). 10.1117/12.241874
20. C.-H. Choi and C.-J. Kim, Nanotechnology NNOTER 0957-4484 17, 5326 (2006). 10.1088/0957-4484/17/21/007 (Pubitemid 46069296)
21. K. J. Morton, G. Nieberg, S. Bai, and S. Y. Chou, Nanotechnology NNOTER 0957-4484 19, 345301 (2008). 10.1088/0957-4484/19/34/345301