Solid-immersion Lloyd's mirror as a testbed for plasmon-enhanced ultrahigh numerical aperture lithography

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 10, Issue 3, 2011, Pages

  Mehrotra, Prateek ^a   Holzwarth, Charles W ^a   Blaikie, Richard J ^a  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

Author keywords

Evanescent field enhancement; Evanescent wave reflection; Interference lithography; Lloyd's mirror; Plasmonics ; Solid immersion; Ultrahigh NA; Yttrium aluminum garnet

Indexed keywords

ALUMINUM; LITHOGRAPHY; MIRRORS; YTTRIUM;

EVANESCENT FIELDS; EVANESCENT WAVE; INTERFERENCE LITHOGRAPHY; LLOYD'S MIRROR; PLASMONICS; SOLID-IMMERSION; ULTRAHIGH-NA; YTTRIUM-ALUMINUM-GARNET;

PLASMONS;

EID: 80055049407     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3624516     Document Type: Article

References (16)

1. C. Auth, M. Buehler, A. Cappellani, C. Choi, G. Ding, W. Han, S. M. Joshi, B. McIntyre, M. Prince, P. Ranade, J. Sandford, and C. Thomas, Intel Technol J. 12(2) (2008).
2. International Technology Roadmap for Semiconductors (ITRS) (2010).
3. B. W. Smith, Y. F. Fan, J. M. Zhou, N. Lafferty, and A. Estroff, in OpticalMicrolithography XIX, Parts 1-3, D. G. Flagello, Ed.,Vol. 6154, pp. U200-U208, SPIE Advanced Lithography, San Jose, CA (2006).
4. J. de Boor, D. S. Kim, and V. Schmidt, "Sub-50 nm patterning by immersion interference lithography using a Littrow prism as a Lloyd's interferometer," Opt. Lett. 35, 3450-3452 (2010).
5. B. W. Smith and J. Cashmore, in Optical Microlithography XV, Parts 1 and 2, A. Yen, Ed., Vol. 4691, pp. 11-24, SPIE Advanced Lithography, San Jose, CA (2002).
6. B.W. Smith and J. Zhou, "Optical microlithography," Proc. SPIE 6520, 65200A (2007).
7. J. M. Zhou, N. V. Lafferty, B. W. Smith, and J. H. Burnett, in Optical Microlithography XX, Parts 1-3, D. G. Flagello, Ed., Vol. 6520, pp. T5204-T5204, SPIE Advanced Lithography, San Jose, CA (2007).
8. J. B. Pendry, "Negative Refraction Makes a Perfect Lens," Phys. Rev. Lett. 85, 3966-3969 (2000). (Pubitemid 32027228)
9. D. O. S. Melville and R. J. Blaikie, "Analysis and optimization of multilayer silver superlenses for near-field optical lithography," Physica B 394, 197-202 (2007). (Pubitemid 46634993)
10. R. J. Blaikie, M. M. Alkaisi, S. J. McNab, and D. O. S. Melville, "Nanoscale optical pattering using evanescent filed and surface plasmons," Int. J. Nanosci. 3, 405-417 (2004).
11. M. D. Arnold and R. J. Blaikie, "Subwavelength optical imaging of evanescent fields using reflections from plasmonic slabs," Opt. Express 15, 11542-11552 (2007). (Pubitemid 47364704)
12. J. H. Burnett, S. G. Kaplan, E. L. Shirley, D. Horowitz, W. Clauss, A. Grenville, and C. V. Peski, "Optical Microlithography," Proc. SPIE 6154 (2006).
13. J. H. Burnett, "Optical Materials for Immersion Lithography," J. Photopolym. Sci. Technol. 18, 655-662 (2005). (Pubitemid 40989871)
14. J. H. Burnett, S. G. Kaplan, E. L. Shirley, P. J. Tompkins, and J. E. Webb, in Optical Microlithography XVIII, Parts 1-3, B. W. Smith, Ed., Vol. 5754, pp. 611-621, SPIE Advanced Lithography, San Jose, CA (2005).
15. K. Zhang, Li, D., Electromagnetic Theory for Microwaves and Optoelectronics, 2nd Ed., Springer, Berlin Heidelberg, New York (2007).
16. M. Ohtsu, Near-field Nano/Atom Optics and Technology, Springer, Berlin (1998).