Large-area pattern transfer of metallic nanostructures on glass substrates via interference lithography

Nanotechnology

Volumn 22, Issue 28, 2011, Pages

  Du, Ke ^a   Wathuthanthri, Ishan ^a   Mao, Weidong ^a   Xu, Wei ^a   Choi, Chang Hwan ^a  

^a Stevens Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROLLED THICKNESS; GLASS SUBSTRATES; INTERFERENCE LITHOGRAPHY; LARGE SURFACE AREA; LASER INTERFERENCE LITHOGRAPHY; METAL FILM; METALLIC NANOSTRUCTURE; NANO PATTERN; NANO-FABRICATION METHODS; PATTERN PERIODICITY; PATTERN TRANSFERS; SACRIFICIAL ETCHING; SCIENTIFIC AND ENGINEERING APPLICATIONS; SURFACE AREA; TEMPLATE STRUCTURES; TRANSPARENT GLASS; UNIFORM ARRAY; WAFER-SCALE;

GLASS; GLASS LASERS; LITHOGRAPHY; NANOPHOTONICS; NANOSTRUCTURES; PHOTORESISTS;

SUBSTRATES;

EID: 79959247189     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/28/285306     Document Type: Article

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