SiO2 single layer for reduction of the standing wave effects in the interference lithography of deep photoresist structures on Si

Microelectronics Journal

Volumn 37, Issue 11, 2006, Pages 1265-1270

  Carvalho, Edson J ^a   Alves, Marco A R ^a   Braga, Edmundo S ^a   Cescato, Lucila ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

Deep photoresist structures; Interference lithography; RIE plasma etching; Standing wave pattern

Indexed keywords

ADHESION; LIGHT INTERFERENCE; LITHOGRAPHY; PHOTORESISTS; STANDING WAVE METERS; STRUCTURES (BUILT OBJECTS);

DEEP PHOTORESIST STRUCTURES; INTERFERENCE LITHOGRAPHY; RIE PLASMA ETCHING; STANDING WAVE PATTERNS (SW);

SILICA;

EID: 33750609049     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2006.07.027     Document Type: Article

References (21)

1. Ng W., Hong C.S., and Yariv A. IEEE Trans. Electron Devices 25 (1978) 1193
2. Campbell M., Sharp D.N., Harrison M.T., Denning R.G., and Turberfield A.J. Nature 404 (2000) 53
3. Choi J.O., Jeong H.S., Pflug D.G., Akinwande A.I., and Smith H.I. Appl. Phys. Lett. 74 (1999) 3050
4. Chen W., Zaidi S.H., Brueck S.R., and Devine D.J. J. Vac. Sci. Technol. B 14 5 (1996) 3339
5. Zaidi S.H., and Brueck S.R.J. Appl. Opt. 27 14 (1988) 2999
6. Efremow N.N., Economou N.P., Bezjian K., Dana S.S., and Smith H.I. J. Vac. Sci. Technol. B 19 4 (1981) 1234
7. Lang R.J., and Smilowitz B. IEEE Trans Sonics Ultrasonics 27 3 (1980) 134
8. Clariant: http://www.azresist.com.
9. Shippley: http://www.chestech.co.uk/
10. Schattenburg M.L., Aucoin R.J., and Fleming R.C. J. Vac. Sci. Technol. B 13 6 (1995) 3007
11. Chen H.L., Chu T.C., Li M.Y., Ko F.H., Cheng H.C., and Huang T.Y. J. Vac. Sci. Technol. B 19 6 (2001) 2381
12. Ahrens R.G., and Tennant D.M. Microelectron. Eng. 35 (1997) 229
13. Lezec H.J., Anderson E.H., and Smith H.I. J. Vac. Sci. Technol. B 1 14 (1983) 1204
14. Walsh M.E., Hao Y., Ross C.A., and Smith H.I. J Vac. Sci. Technol. B 18 6 (2000) 3539
15. Heavens O.S. Optical Properties of Thin Solid Films (1991), Dover, New York
16. Frejlich J., Cescato L., and Mendes G.F. Appl. Opt. 27 10 (1988) 1967
17. Mello B.A., Costa I.F., Lima C.R.A., and Cescato L. Appl. Opt. 34 4 (1995) 597
18. Nagata H., and Kawai A. Jpn. J. Appl. Phys. 28 10 (1989) 2137
19. Lussow R.O. J. Electrochem. Soc.: Solid State Sci. 115 6 (1968) 660
20. Kawai A., Nagata H., Abe H., and Takata M. Jpn. J. Appl. Phys. 30 1 (1991) 121
21. Gupta T.K. Thin Solid Films 75 (1981) 319