From two-dimensional colloidal self-assembly to three-dimensional nanolithography

Nano Letters

Volumn 11, Issue 6, 2011, Pages 2533-2537

  Chang, C H ^a   Tian, L ^a   Hesse, W R ^a   Gao, H ^b   Choi, H J ^a   Kim, J G ^a   Siddiqui, M ^a   Barbastathis, G ^a,c  

^a USA   (United States)

^b Department of Electrical Engineering and Computer Science   (United States)

^c SINGAPORE MIT ALLIANCE FOR RESEARCH AND TECHNOLOGY   (Singapore)

Author keywords

3D nanostructures; colloidal assembly; nanosphere lithography; phase lithography

Indexed keywords

3D NANOSTRUCTURES; COLLOIDAL ASSEMBLY; COLLOIDAL SELF-ASSEMBLY; FABRICATION COST; FOCAL SPOT; INTENSITY DISTRIBUTION; MINIMUM FEATURE SIZES; NANOSCALE RESEARCH; NANOSPHERE LITHOGRAPHY; OPERATING WAVELENGTH; PATTERN RESOLUTION; PERIODIC ARRAYS; PHASE LITHOGRAPHY; SELF-ASSEMBLED; SELF-ASSEMBLY METHOD; TALBOT EFFECTS; THREE-DIMENSIONAL (3D) NANOSTRUCTURES; TOPDOWN;

INDUSTRIAL RESEARCH; LITHOGRAPHY; NANOLITHOGRAPHY; NANOSPHERES; NANOTECHNOLOGY; PERIODIC STRUCTURES; PHOTORESISTS; SELF ASSEMBLY;

THREE DIMENSIONAL;

NANOMATERIAL;

ARTICLE; CHEMISTRY; COLLOID; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY;

COLLOIDS; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTIES;

EID: 79958796514     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl2011824     Document Type: Article

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