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Volumn 52, Issue 1 PART2, 2013, Pages
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Effect of direct current power to Ti-target on the composition, structure and characterization of the Ti (0-2.36 at. %), Al codoped ZnO sputtering thin films
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Author keywords
[No Author keywords available]
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Indexed keywords
AVERAGE SURFACE ROUGHNESS;
CO-DOPED ZNO;
DC POWER;
DEPTH PROFILE;
DIRECT CURRENT;
DIRECT CURRENT POWER;
ELECTRICAL RESISTIVITY;
FIELD EMISSION SCANNING ELECTRON MICROSCOPES;
FOUR-POINT PROBE;
GLASS SUBSTRATES;
MAGNETRON SPUTTERING SYSTEMS;
PURE AL;
PURE ZNO;
RADIO FREQUENCY POWER;
THICKNESS OF THE FILM;
TRANSPARENT CONDUCTIVE;
UV-VIS LIGHT;
VISIBLE SPECTRA;
WORKING PRESSURES;
WURTZITE STRUCTURE;
ALUMINUM;
ATOMIC FORCE MICROSCOPY;
ELECTRIC CONDUCTIVITY;
ENERGY DISPERSIVE SPECTROSCOPY;
MAGNETRON SPUTTERING;
NITRIDES;
PHOTOELECTRONS;
SUBSTRATES;
X RAY DIFFRACTION;
X RAY PHOTOELECTRON SPECTROSCOPY;
ZINC OXIDE;
ZINC SULFIDE;
CONDUCTIVE FILMS;
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EID: 84872862429
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.7567/JJAP.52.01AC06 Document Type: Article |
Times cited : (4)
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References (37)
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