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Volumn 52, Issue 1 PART2, 2013, Pages

Effect of direct current power to Ti-target on the composition, structure and characterization of the Ti (0-2.36 at. %), Al codoped ZnO sputtering thin films

Author keywords

[No Author keywords available]

Indexed keywords

AVERAGE SURFACE ROUGHNESS; CO-DOPED ZNO; DC POWER; DEPTH PROFILE; DIRECT CURRENT; DIRECT CURRENT POWER; ELECTRICAL RESISTIVITY; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; FOUR-POINT PROBE; GLASS SUBSTRATES; MAGNETRON SPUTTERING SYSTEMS; PURE AL; PURE ZNO; RADIO FREQUENCY POWER; THICKNESS OF THE FILM; TRANSPARENT CONDUCTIVE; UV-VIS LIGHT; VISIBLE SPECTRA; WORKING PRESSURES; WURTZITE STRUCTURE;

EID: 84872862429     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.7567/JJAP.52.01AC06     Document Type: Article
Times cited : (4)

References (37)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.