Effect of thermal annealing on electrical properties of transparent conductive Ga-doped ZnO films prepared by ion-plating using direct-current arc discharge

Thin Solid Films

Volumn 517, Issue 10, 2009, Pages 3134-3137

  Yamada, Takahiro ^a   Miyake, Aki ^a   Makino, Hisao ^a   Yamamoto, Naoki ^a   Yamamoto, Tetsuya ^a  

^a KOCHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Annealing; GZO; Segregation; TCO; Thermal desorption

Indexed keywords

ANNEALING; ATMOSPHERIC PRESSURE; CARRIER CONCENTRATION; DOPING (ADDITIVES); ELECTRIC PROPERTIES; GALLIUM ALLOYS; GRAIN BOUNDARIES; SEGREGATION (METALLOGRAPHY); SEMICONDUCTING ZINC COMPOUNDS; SURFACE CHEMISTRY; THERMAL DESORPTION; ZINC; ZINC OXIDE;

ANNEALING TEMPERATURES; ARC DISCHARGES; DIRECT CURRENTS; ELECTRICAL PROPERTIES; GA DOPANTS; GA-DOPED ZNO; GLASS SUBSTRATES; GRAIN-BOUNDARY SEGREGATIONS; GZO; HIGH PURITIES; ION PLATINGS; SEGREGATION; TCO; TEMPERATURE RANGES; THERMAL-ANNEALING; TRANSPARENT CONDUCTIVE;

CONDUCTIVE FILMS;

EID: 61449233171     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.11.081     Document Type: Article

References (19)

1. Hirasawa H., Yoshida M., Nakamura S., Suzuki Y., Okada S., and Kondo K. Sol. Energy Mater. Sol. Cells 67 (2001) 231
2. Agura H., Suzuki A., Matsushita T., Aoki T., and Okuda M. Thin Solid Films 445 (2003) 263
3. Iwata K., Sakemi T., Yamada A., Fons P., Awai K., Yamamoto T., Matsubara M., Tampo H., and Niki S. Thin Solid Films 445 (2003) 274
4. Minami T., Miyata T., and Ohtani Y. Phys. Stat. Sol. 204 9 (2007) 3145
5. Yamada T., Miyake A., Kishimoto S., Makino H., Yamamoto N., and Yamamoto T. Appl. Phys. Lett. 91 (2007) 051915
6. Fang G.J., Li D., and Yao B. Thin Solid Films 418 (2002) 156
7. Khranovskyy V., Grossner U., Lasorenko V., Lashkarev G., Svensson B.G., and Yakimova R. Phys. Stat. Sol. 3 4 (2006) 780
8. Kim J.H., Ahn B.D., Lee C.H., Jeon K.A., Kang H.S., and Lee S.Y. J. Appl. Phys. 100 (2006) 113515
9. Gonçalves G., Elangovan E., Barquinha P., Pereira L., Martins R., and Fortunato E. Thin Solid Films 515 (2007) 8562
10. Ahn B.D., Oh S.H., Lee C.H., Kim G.H., Kim H.J., and Lee S.Y. J. Crystal Growth 309 (2007) 128
11. Takata S., Minami T., and Nanto H. Thin Solid Films 135 (1986) 183
12. Williamson G.K., and Hall W.H. Acta Metallurgica 1 (1953) 22
13. T. Yamada, T. Morizane, T. Arimitsu, A. Miyake, H. Makino, N. Yamamoto and T. Yamamoto, to be published in Thin Solid Films.
14. Yamamoto N., Yamada T., Miyake A., Makino H., Kishimoto S., and Yamamoto T. J. Electrochem. Soc. 155 (2008) J221
15. Hiramatsu T., Furuta M., Furuta H., Matsuda T., and Hirao T. Jpn. J. Appl. Phys. 46 (2007) 3319
16. Esser P., and Göpel W. Surf. Sci. 97 (1980) 309
17. Oh B., Jeong M., Kim D., Lee W., and Myoung J. J. Cryst. Growth 281 (2005) 475
18. Wang J., Hokkanen B., and Burghaus U. Surf. Sci. 577 (2005) 158
19. Wang J., and Burghaus U. Chem. Phys. Lett. 403 (2005) 42