Fabrication of 3D nano-structures using reverse imprint lithography

Nanotechnology

Volumn 24, Issue 4, 2013, Pages

  Han, Kang Soo ^a   Hong, Sung Hoon ^b   Kim, Kang In ^c   Cho, Joong Yeon ^a   Choi, Kyung Woo ^d   Lee, Heon ^a  

^a Korea University   (South Korea)

^b UNIVERSITY OF PENNSYLVANIA   (United States)

^c Hynix Semiconductor Inc   (South Korea)

^d Korea Institute of Nuclear Safety (KINS)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

2D PATTERNS; FABRICATION PROCESS; IMPRINT LITHOGRAPHY; LIGHT EXTRACTION; OPTICAL EFFECTS; POLYDIMETHYLSILOXANE PDMS; SILICON STAMP; UV CURABLE; UV CURING PROCESS; UV-CURABLE RESINS;

CURING; FABRICATION; NANOIMPRINT LITHOGRAPHY; NANOSTRUCTURES; RESINS; THREE DIMENSIONAL; ZINC OXIDE;

LIGHT EMITTING DIODES;

NANOMATERIAL;

ARTICLE; CHEMISTRY; CRYSTALLIZATION; EQUIPMENT; EQUIPMENT DESIGN; EQUIPMENT FAILURE; ILLUMINATION; METHODOLOGY; MOLECULAR IMPRINTING; PARTICLE SIZE; PHOTOGRAPHY; SEMICONDUCTOR; ULTRASTRUCTURE;

CRYSTALLIZATION; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LIGHTING; MOLECULAR IMPRINTING; NANOSTRUCTURES; PARTICLE SIZE; PHOTOGRAPHY; SEMICONDUCTORS;

MLCS; MLOWN;

EID: 84872156758     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/24/4/045304     Document Type: Article

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