Three-dimensional multilayered microstructure fabricated by imprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 2, 2005, Pages 375-379

  Ooe, H ^a,b   Morimatsu, M ^a   Yoshikawa, T ^a   Kawata, H ^a   Hirai, Y ^a  

^a Osaka Prefecture University   (Japan)

^b MURATA MANUFACTURING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; MICROSTRUCTURE; PARAMETER ESTIMATION; POLYMERS;

FLUID CHANNELS; IMPRINT MODES; POLYMER PROPERTIES; THREE-DIMENSIONAL MULTILAYERED MICROSTRUCTURE;

MULTILAYERS;

EID: 31144444472     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1861929     Document Type: Conference Paper

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