Systematic considerations for the patterning of photonic crystal devices by electron beam lithography

Optics Communications

Volumn 271, Issue 1, 2007, Pages 241-247

  Yu, Hejun ^a   Yu, Jinzhong ^a   Sun, Fei ^a   Li, Zhiyong ^a   Chen, Shaowu ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

E beam lithography; Photonic crystal; Proximity effect correction; Resist; Stitching error

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ERROR ANALYSIS; ETCHING; OPTICAL PROPERTIES; OPTICAL WAVEGUIDES; OPTIMIZATION;

PHOTONIC CRYSTAL DEVICES; PROXIMITY EFFECT; STITCHING ERROR; TAPER-ADDED WAVEGUIDES;

OPTICAL DEVICES;

EID: 33846091243     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2006.10.034     Document Type: Article

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