Anti-reflection and hydrophobic characteristics of M-PDMS based moth-eye nano-patterns on protection glass of photovoltaic systems

Progress in Photovoltaics: Research and Applications

Volumn 19, Issue 3, 2011, Pages 339-344

  Shin, Ju Hyeon ^a   Han, Kang Soo ^a   Lee, Heon ^a  

^a Korea University   (South Korea)

Author keywords

M PDMS; moth eye pattern; nano imprint lithography; photovoltaic system; self cleaning; transmittance

Indexed keywords

M-PDMS; MOTH-EYE PATTERN; PHOTOVOLTAIC SYSTEMS; SELF-CLEANING; TRANSMITTANCE;

CLEANING; CONTACT ANGLE; GLASS; HYDROPHOBICITY; LIGHT REFLECTION; MICROCHANNELS; NANOIMPRINT LITHOGRAPHY; PHOTOVOLTAIC EFFECTS; PLATES (STRUCTURAL COMPONENTS); SELF ASSEMBLED MONOLAYERS; SULFURIC ACID; SURFACE CHEMISTRY;

EYE PROTECTION;

EID: 79953655402     PISSN: 10627995     EISSN: 1099159X     Source Type: Journal    
DOI: 10.1002/pip.1051     Document Type: Article

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