Tantalum oxide nanocoatings prepared by atomic layer and filtered cathodic arc deposition for corrosion protection of steel: Comparative surface and electrochemical analysis

Electrochimica Acta

Volumn 90, Issue , 2013, Pages 232-245

  Díaz, Belén ^a   Światowska, Jolanta ^a   Maurice, Vincent ^a   Seyeux, Antoine ^a   Härkönen, Emma ^b   Ritala, Mikko ^b   Tervakangas, Sanna ^c   Kolehmainen, Jukka ^c   Marcus, Philippe ^a  

^a CNRS   (France)

^b UNIVERSITY OF HELSINKI   (Finland)

^c DIARC Technology Inc   (Finland)

Author keywords

ALD; Corrosion; EIS; FCAD; Oxide coatings; Steel; Tantalum oxide; ToF SIMS; XPS

Indexed keywords

ALD; EIS; FCAD; OXIDE COATING; TOF SIMS;

CORROSION; CORROSION PROTECTION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; INTERFACES (MATERIALS); PHOTOELECTRONS; PROTECTIVE COATINGS; SECONDARY ION MASS SPECTROMETRY; SODIUM CHLORIDE; STEEL; TANTALUM OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION;

EID: 84871911258     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2012.12.007     Document Type: Article

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