Chromium and tantalum oxide nanocoatings prepared by filtered cathodic arc deposition for corrosion protection of carbon steel

Surface and Coatings Technology

Volumn 206, Issue 19-20, 2012, Pages 3903-3910

  Díaz, Belén ^a,b   Światowska, Jolanta ^a,b   Maurice, Vincent ^a,b   Pisarek, Marcin ^a,b   Seyeux, Antoine ^a,b   Zanna, Sandrine ^a,b   Tervakangas, Sanna ^c   Kolehmainen, Jukka ^c   Marcus, Philippe ^a,b  

^a PSL RESEARCH UNIVERSITY   (France)

^b CNRS   (France)

^c DIARC Technology Inc   (Finland)

Author keywords

Chromium oxide; Corrosion protection; FCAD; Tantalum oxide; Thin films; ToF SIMS

Indexed keywords

BULK COATING; CATHODIC ARC DEPOSITION; CHEMICAL ARCHITECTURE; CHROMIUM OXIDES; COLUMNAR GROWTH; COMBINED ANALYSIS; DEPOSITION PROCESS; DUPLEX STRUCTURES; FCAD; IN-LINE; INSULATING PROPERTIES; LOCALIZED CORROSION; METALLIC PARTICLES; NANO-COATINGS; NATIVE OXIDE LAYER; ORGANIC GROUP; POLARIZATION CURVES; PRE-ETCHING; RESIDUAL CARBON; STEEL SURFACE; TANTALUM OXIDE COATINGS; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY; TOF SIMS;

CARBON STEEL; CHEMICAL ANALYSIS; CHROMATE COATINGS; CORROSION PROTECTION; DISSOLUTION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; GRAIN BOUNDARIES; IRON OXIDES; PHOTOELECTRONS; SECONDARY ION MASS SPECTROMETRY; SODIUM CHLORIDE; STOICHIOMETRY; TANTALUM; TANTALUM OXIDES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHROMIUM;

EID: 84861460174     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.03.048     Document Type: Article

References (52)

1. Rudenja S., Leygraf C., Pan J., Kulu P., Talimets E., Mikli V. Surf. Coat. Technol. 1999, 114:129.
2. Liu C., Bi Q., Mattews A. Corros. Sci. 2001, 43:1953.
3. Grips V.K.W., Selvi V.E., Barshilia H.C., Rajam K.S. Electrochim. Acta 2006, 51:3461.
4. PalDey S., Deevi S.C. Mater. Sci. Eng. A-Struct. 2003, 342:58.
5. Brown I.G. Annu. Rev. Mater. Sci. 1998, 28:243.
6. Gorokhovskya V.I., Bhatb D.G., Shivpuric R., Kulkarnic K., Bhattacharyad R., Raid A.K. Surf. Coat. Technol. 2001, 140:215.
7. Tay B.K., Zhao Z.W., Chua D.H.C. Mater. Sci. Eng., R 2006, 52:1.
8. Wang D.-Y., Chang C.-L., Wong K.-W., Li Y.-W., Ho W.-Y. Surf. Coat. Technol. 1999, 120-121:388.
9. Martin P.J., Bendavid A., Netterfield R.P., Kinder T.J., Jahan F., Smith G. Surf. Coat. Technol. 1999, 112:257.
10. Hsu C.-H., Lee C.-Y., Lee C.-C. Thin Solid Films 2009, 517:5212.
11. Hsu C.-H., Lee C.-C., Ho W.-Y. Thin Solid Films 2008, 516:4826.
12. Chang C.-L., Chen J.-H., Tsai P.-C., Ho W.-Y., Wang D.-Y. Surf. Coat. Technol. 2008, 203:619.
13. Khun N.W., Liu E., Zeng X.T. Corros. Sci. 2009, 51:2158.
14. Lin C.-C., Chang K.-L., Shih H.C. Appl. Surf. Sci. 2007, 253:5011.
15. Díaz B., Härkönen E., Swiatowska J., Maurice V., Seyeux A., Marcus P., Ritala M. Corros. Sci. 2011, 53:2168.
16. Potts S.E., Schmalz L., Fenker M., Díaz B., Światowska J., Maurice V., Seyeux A., Marcus P., Radnóczi G., Tóth L., van de Sanden M.C.M., Kessels W.M.M. J. Electrochem. Soc. 2011, 158:C132.
17. Díaz B., Härkönen E., Swiatowska J., Maurice V., Seyeux A., Ritala M., Marcus P. Electrochim. Acta 2011, 56:9609.
18. Härkönen E., Diaz B., Seyeux A., Vehkamäki M., Sajavaara T., Fenker M., Swiatowska J., Maurice V., Marcus P., Ritala M. J. Electrochem. Soc. 2011, 158:C369.
19. Tato W., Landolt D. J. Electrochem. Soc. 1998, 145:4173.
20. Ahn S.H., Choi Y.S., Kim J.G., Han J.G. Surf. Coat. Technol. 2002, 150:319.
21. Pratt A.R., McIntyre N.S. Surf. Interface Anal. 1996, 24:529.
22. Oku M., Suzuki S., Ohtsu N., Shishido T., Wagatsuma K. Appl. Surf. Sci. 2008, 254:5141.
23. Chambers S.A., Droubay T. Phys. Rev. B 2001, 64:075410.
24. Unveren E., Kemnitz E., Hutton S., Lippitz A., Unger W.E.S. Surf. Interface Anal. 2004, 36:92.
25. Handbook of X-ray Photoelectron Spectroscopy 1979, Physical Electronics Division, Perkin-Elmer Corporation, Eden Prairie, MN. C.D. Wagner, W.M. Riggs, L.E. Davis, J.E. Moulder, G.E. Muilenberg (Eds.).
26. Maurice V., Cadot S., Marcus P. Surf. Sci. 2000, 458:195.
27. Weaver J.F., Hagelin-Weaver H.A.E., Hoflund G.B., Salaita G.N. Appl. Surf. Sci. 2006, 252:7895.
28. Barshilia H.C., Rajam K.S. Appl. Surf. Sci. 2008, 255:2925.
29. Zhang L., Kuhu M., Diebold U. Surf. Sci. 1997, 375:1.
30. Maurice V., Yang W.P., Marcus P. J. Electrochem. Soc. 1994, 141:3016.
31. Li J.T., Maurice V., Swiatowska-Mrowiecka J., Seyeux A., Zanna S., Klein L., Sun S.G., Marcus P. Electrochim. Acta 2009, 54:3700.
32. Kerrec O., Devilliers D., Groult H., Marcus P. Mat. Sci. Eng. B-Adv. 1998, 55:134.
33. Atanassova E., Tyuliev G., Paskaleva A., Spassov D., Kostov K. Appl. Surf. Sci. 2004, 225:86.
34. Imai Y., Watanabe A., Mukaida M., Osato K., Tsunoda T., Kameyama T., Fukuda K. Thin Solid Films 1995, 261:76.
35. Gitmans F., Sitar Z., Günter P. Vacuum 1995, 46:939.
36. Zang J.Y., Boyd I.W. Appl. Surf. Sci. 2000, 168:234.
37. Lecuyer S., Quemerais A., Jezequel G. Surf. Interface Anal. 1992, 18:257.
38. An C.H., Sugimoto K. J. Electrochem. Soc. 1994, 141:853.
39. Natishan P.M., McCafferty E., Puckett P.R., Michel S. Corros. Sci. 1996, 38:1043.
40. Yoo Y.H., Le D.P., Kim J.G., Kim S.K., Vinh P.V. Thin Solid Films 2008, 516:3544.
41. Marin E., Guzman L., Lanzutti A., Fedrizzi L., Saikkonen M. Electrochem. Commun. 2009, 11:2060.
42. Díaz B., Swiatowska J., Maurice V., Seyeux A., Bormand B., Härkönen E., Ritala M., Marcus P. Electrochim. Acta 2011, 56:10516.
43. Marin E., Lanzutti A., Guzman L., Fedrizzi L., Saikkonen M. J. Coat. Technol. Res. 2011, 8:655.
44. Panjan P., Cekada M., Panjan M., Kek-Merl D. Vacuum 2010, 84:209.
45. o 28 2000, 332. The Institute of Materials, London. P.L. Bonora, F. Deflorian (Eds.).
46. Freire L., Nóvoa X.R., Montemor F., Carmenzin M.J. Mater. Chem. Phys. 2009, 114:962.
47. Mulder W.H., Sluyters J.H., Pajkossy T., Nyikos I. J. Electroanal. Chem. 1990, 285:103.
48. Schiller C.A., Strunz W. Electrochim. Acta 2001, 46:3619.
49. Kim C.H., Pyun S.I., Kim J.H. Electrochim. Acta 2003, 48:3455.
50. Jorcin J.B., Orazem M.E., Pebere N., Tribollet B. Electrochim. Acta 2006, 51:1473.
51. Ferreira M.G.S., Da Cunha Belo M., Hakiki N.E., Goodlet G., Montemor M.F., Simoes A.M.P. J. Braz. Chem. Soc. 2002, 13:433.
52. Cavigliasso G.E., Esplandiu M.J., Macagno V.A. J. Appl. Electrochem. 1998, 28:1213.