SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 112, Issue 1-3, 1999, Pages 257-260

Plasma deposition of tribological and optical thin film materials with a filtered cathodic arc source

(6) Martin, P J a Bendavid, A a Netterfield, R P a Kinder, T J a Jahan, F b Smith, G b

a CSIRO (Australia)

b UNIVERSITY OF TECHNOLOGY SYDNEY (Australia)

Author keywords

Filtered arc; Oxides; Stress; Titanium nitride

Indexed keywords

CATHODES; DEPOSITION; DIELECTRIC FILMS; FRICTION MATERIALS; HARDNESS TESTING; METALLIC FILMS; MICROHARDNESS; OPTICAL FILMS; PLASMA APPLICATIONS; STRESS ANALYSIS; THIN FILMS; TRIBOLOGY;

CATHODIC ARC SOURCES; FILTERED ARC DEPOSITION (FAD);

TITANIUM NITRIDE;

DEPOSITION; FILM; TRIBOLOGY; WEAR RESISTANCE;

EID: 0033079772 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(98)00784-1 Document Type: Article

Times cited : (30)

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