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Volumn 5, Issue 1, 2013, Pages 422-428
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Programmable complementary resistive switching behaviours of a plasma-oxidised titanium oxide nanolayer
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Author keywords
[No Author keywords available]
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Indexed keywords
COST-EFFICIENT;
NANO LAYERS;
NANOSCALE CROSSBAR;
NON-VOLATILE;
OPERATION VOLTAGE;
PLASMA OXIDATION;
RESISTIVE SWITCHING;
RESISTIVE SWITCHING MECHANISMS;
RESISTIVE SWITCHING MEMORIES;
ROOM TEMPERATURE;
SEMICONDUCTOR TECHNOLOGY;
TIN THIN FILMS;
TIO;
TITANIUM OXYNITRIDE;
OXIDATION;
SEMICONDUCTOR DEVICE MANUFACTURE;
SWITCHING SYSTEMS;
TITANIUM;
TITANIUM NITRIDE;
TITANIUM OXIDES;
NANOMATERIAL;
TITANIUM;
TITANIUM DIOXIDE;
ARTICLE;
CHEMISTRY;
CRYSTALLIZATION;
DATA STORAGE DEVICE;
EQUIPMENT DESIGN;
EQUIPMENT FAILURE;
IMPEDANCE;
MATERIALS TESTING;
METHODOLOGY;
OXIDATION REDUCTION REACTION;
PARTICLE SIZE;
PLASMA GAS;
SEMICONDUCTOR;
ULTRASTRUCTURE;
COMPUTER STORAGE DEVICES;
CRYSTALLIZATION;
ELECTRIC IMPEDANCE;
EQUIPMENT DESIGN;
EQUIPMENT FAILURE ANALYSIS;
MATERIALS TESTING;
NANOSTRUCTURES;
OXIDATION-REDUCTION;
PARTICLE SIZE;
PLASMA GASES;
SEMICONDUCTORS;
TITANIUM;
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EID: 84870940337
PISSN: 20403364
EISSN: 20403372
Source Type: Journal
DOI: 10.1039/c2nr32743k Document Type: Article |
Times cited : (67)
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References (40)
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