Deposition of the low resistive Ag-N dual acceptor doped p-type ZnO thin films

Ceramics International

Volumn 39, Issue 2, 2013, Pages 1799-1806

  Swapna, R ^a   Santhosh Kumar, M C ^a  

^a NATIONAL INSTITUTE OF TECHNOLOGY   (India)

Author keywords

A. Films; B. Grain size; C. Electrical properties; D. ZnO

Indexed keywords

3D SURFACE; C-AXIS ORIENTATIONS; CRYSTALLINE QUALITY; DEPOSITED FILMS; DOPING CONCENTRATION; ELEMENTAL MAPPING; ENERGY DISPERSIVE X RAY SPECTROSCOPY; GLASS SUBSTRATES; GRAIN SIZE; HALL MEASUREMENTS; LUMINESCENCE SPECTROSCOPY; NANOCRYSTALLINE AG; NATIVE DEFECT; P TYPE ZNO THIN FILM; P-TYPE CONDUCTION; SEM MICROGRAPHS; SPHERICAL GRAINS; SPRAY-PYROLYSIS TECHNIQUES; VISIBLE REGION; XRD; ZNO; ZNO FILMS;

ATOMIC FORCE MICROSCOPY; DEPOSITS; ELECTRIC PROPERTIES; METALLIC FILMS; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; SPRAY PYROLYSIS; SUBSTRATES; SURFACE ROUGHNESS; X RAY DIFFRACTION; X RAY SPECTROSCOPY; ZINC OXIDE;

SILVER;

EID: 84870291569     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2012.08.027     Document Type: Article

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