Effects of laser irradiation on the structure and optical properties of ZnO thin films

Materials Letters

Volumn 64, Issue 19, 2010, Pages 2072-2075

  Lu, Hui ^a   Tu, Yaoquan ^b   Lin, Xian ^a   Fang, Bin ^a   Luo, Duanbin ^a   Laaksonen, Aatto ^c  

^a EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b ÖREBRO UNIVERSITY   (Sweden)

^c STOCKHOLM UNIVERSITY   (Sweden)

Author keywords

Annealing; Laser treatment; Microstructure; Optical properties; Semiconductors; Thin films

Indexed keywords

AS-GROWN FILMS; C-AXIS ORIENTATIONS; CRYSTALLINE QUALITY; GLASS SUBSTRATES; GRAIN SIZE; IRRADIATION TREATMENT; LASER IRRADIATIONS; LASER TREATMENT; RESIDUAL COMPRESSIVE STRESS; SEMICONDUCTORS; SEMICONDUCTORS THIN FILMS; SURFACE MICROSTRUCTURES; THERMAL-ANNEALING; UV ABSORPTION; ZNO FILMS; ZNO THIN FILM;

ANNEALING; ATOMIC FORCE MICROSCOPY; CHEMICAL MODIFICATION; GLASS LASERS; IRRADIATION; METALLIC FILMS; MICROSTRUCTURE; OPTICAL PROPERTIES; OPTICAL SYSTEMS; SEMICONDUCTOR LASERS; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; ZINC OXIDE;

OPTICAL FILMS;

EID: 77954770971     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2010.06.022     Document Type: Article

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