Photoinduced mesoporosity of Tert-butoxycarbonyl acrylic photosensitive material with low dielectric constant

Journal of Applied Polymer Science

Volumn 127, Issue 4, 2013, Pages 3269-3277

  Lin, Song Shiang ^a   Chan, Yu Jen ^a   Lee, Yu Der ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

chemical amplification; low dielectric; mesopores; photosensitive

Indexed keywords

ACRYLIC ACIDS; ACRYLIC CO-POLYMERS; CHEMICAL AMPLIFICATION; HEAT AFFECT; IODONIUM SALTS; LEWIS ACID; LOW DIELECTRIC; LOW DIELECTRIC CONSTANTS; MECHANISMS OF FORMATION; MESO-PORES; MESOPOROSITY; MESOPOROUS; PHOTO-INDUCED; PHOTOACID GENERATORS; PHOTOSENSITIVE; PHOTOSENSITIVE MATERIALS; SIDE-CHAINS; SMALL MOLECULES; TERT-BUTOXYCARBONYL (T-BOC); TRANSMISSION ELECTRON MICROSCOPE; ULTRA-VIOLET LIGHT;

BUTENES; CARBOXYLIC ACIDS; LIGHT SENSITIVE MATERIALS; PHOTOCHEMICAL REACTIONS; PHOTOSENSITIVITY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

PHOTOREFRACTIVE MATERIALS;

EID: 84870240696     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.37526     Document Type: Article

References (40)

1. Shamiryan, D.; Abell, T.; Iacopi, F.; Maex, K., Mater. Today. 2004, 7, 34.
2. Homma, T., Mater. Sci. Eng. 1998, R23, 243.
3. Maier, G., Prog. Polym. Sci. 2001, 26, 3.
4. Mocella, M. T., J. Fluorine. Chem. 2003, 122, 87.
5. Sandrin, L.; Silverstein, M. S.; Sacher, E., Polymer 2001, 42, 3761.
6. Su, Y. C.; Chang, F. C., Polymer. 2003, 44, 7989.
7. T. C. Chang, Mor, Y. S.; Liu, P. T.; Tsai, T. M.; Chen, C. W.; Mei, Y. J.; Sze, S. M., Thin. Solid. Films. 2001, 398-399, 523.
8. Kim, J. S.; Kim, H. C.; Lee, B.; Ree, M., Polymer 2005, 46, 7394.
9. Su, Y. C.; Chen, W. C.; Ou, K. L.; Chang, F. C., Polymer 2005, 46, 3758.
10. Kim, K. M.; Adachi, K.; Chujo, Y., Polymer 2002, 43, 1171.
11. Silverstein, M. S.; Caplan, M.S.; Bauer, B. J.; Hedden, R. C.; Lee, H. J.; Landes, B. G., Macromolecules 2005, 38, 4301.
12. Fu, G. D.; Zong, B. Y.; Kang, E. T.; Neoh, K. G.; Lin, C. C.; Liaw, D. J., Ind. Eng. Chem. Res. 2004, 43, 6723.
13. Lee, B.; Yoon, J.; Oh, W.; Hwang, Y.; Heo, K.; Jin, K. S.; Kim, J.; Kim, K. W.; Ree, M., Macromolecules 2005, 38, 3395.
14. Yang, C. C.; Wu, P. T.; Chen, W. C.; Chen, H. L., Polymer 2004, 45, 5691.
15. Yim, J. H.; Jeong, H. D.; Pu, L. S., Thin. Solid. Films. 2005, 476, 46.
16. Yang, S.; Mirau, P.; Sun, J.; Gidley, D. W., Radiat. Phys. Chem. 2003, 68, 351.
17. Lee, Y. J.; Huang, J. M.; Kuo, S. W.; Chang, F. C., Polymer 2005, 46, 10056.
18. Heise, A.; Nguyen, C.; Malek, R.; Hedrick, J. L.; Frank, C. W.; Miller, R. D., Macromolecules 2000, 33, 2346.
19. Oh, W.; Hwang, Y.; Park, Y. H.; Ree, M.; Chu, S. H.; Char, K.; Lee, J. K.; Kim, S. Y., Polymer 2003, 44, 2519.
20. Chen, W. Y.; Wang, Y. Z.; Kuo, S. W.; Huang, C. F.; Tung, P. H.; Chang, F. C., Polymer 2004, 45, 6897.
21. Yang, C. C.; Wu, P. T.; Chen, W. C.; Chen, H. L., Polymer 2004, 45, 5691.
22. Walheim, S.; Schaffer, E.; Mlynek, J.; Steiner, U., Science 1999, 283, 520.
23. Frechet, J. M. J.; Eichler, E.; Ito, H.; Wilson, C. G., Polymer 1983, 24, 995.
24. Ito, H.; Wilson, C. G., Application of photoinitiators to the design of resists for semiconductor manufacturing, Polymers in Electronics, ACS Symposium Series 242, 1984; p 11.
25. Wilson, C. G., Introduction to Microlithography, Thomp, L. F., Wilson, C. G., Bowden, M. J., Eds.; ACS Symposium Series 219, ACS: Washington D.C., 1983; p 153.
26. Iwayanagi, T.; Ueno, T.; Nogogaki, S.; Ito, H.; Wilson, C. G., Electronics and Photonic Applications of Polymers, Bowden, M. J., Turner, S. R., Eds.; Advances in Chemistry Series 218, ACS: Washington D.C., 1988; p 109.
27. Hinsberg, W. D.; Houle, F. A.; Poliskie, G. M.; Pearson, D.; Sanchez, M. I.; Ito, H., J. Phys. Chem. A. 2002, 106, 9776.
28. Conley, W.; Breta, C.; Brunsvold, B.; Depietro, R.; Holmes, S.; Ito, H.; Nunes, R.; Fichtl, G., Proc. SPIE. 1996, 2724, 35.
29. Onishi, Y.; Sato, K.; Chiba, K.; Asano, M.; Niki, H.; Hayase, R.; Hayashi, T., Proc. SPIE. 1996, 2724, 70.
30. Allen, R. D.; Wan, I. Y.; Walraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R., J. Photopolym. Sci. Technol. 1995, 8, 623.
31. Nozaki, K.; Kaimoto, Y.; Takahashi, M.; Takeshi, S.; Abe, N., Chem. Mater. 1994, 6, 1492.
32. Hong, C. S.; Jikei, M.; Kikuchi, R.; Kakimoto, M. A., Macromolecules 2003, 36, 3174.
33. Kudo, K.; Arimitsu, K.; Ohmori, H.; Ito, H.; Ichimura, K., Chem. Mater. 1999, 11, 2119.
34. Doshi, D. A.; Huesing, N. K.; Lu, M.; Fan, H.; Lu, Y.; Potter, K. S.; Potter, B. G. Jr.; Hurd, A. J.; Brinker, C. J., Science 2000, 290, 107.
35. Crevello, J. V., Adv. Polym. Sci. 1982, 62, 1.
36. Itani, T.; Yoshino, H.; Hashimoto, S.; Yamana, M.; Samoto, N.; Kasama, K., Microelectron. Eng. 1997, 35, 149.
37. Maeda, K.; Nakano, K.; Iwasa, S.; Hasegawa, E., Microelectron. Eng. 2002, 61-62, 771.
38. Landis, S.; Pauliac, S.; Hanawa, R.; Suetsugu, M.; Akita, M., Microelectron. Eng. 2004, 73-74, 271.
39. Huang, Y.; Economy, J., Macromolecules 2006, 39, 1850.
40. Penteman, R.; Klink, S. I.; Koning, H. D.; Nisato, G.; Broer, D. J., Nature 2002, 417, 55.