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Chemistry of Materials

Volumn 11, Issue 8, 1999, Pages 2119-2125

3-Phenyl-3,3-ethylenedioxy-1-propyl sulfonates as acid amplifiers to enhance the photosensitivity of positive-working photoresists

(3) Kudo, Kazuaki a Ito, Hiromitsu b Ichimura, Kunihiro a

a Tokyo Institute of Technology ^* (Japan)

b INSTITUTE OF INDUSTRIAL SCIENCE (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000203245 PISSN: 08974756 EISSN: None Source Type: Journal
DOI: 10.1021/cm990054b Document Type: Article

Times cited : (36)

References (17)

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