Product volatilization as a probe of the physics and chemistry of latent image formation in chemically amplified resists

Journal of Physical Chemistry A

Volumn 106, Issue 42, 2002, Pages 9776-9787

  Hinsberg, W D ^a   Houle, F A ^a   Poliskie, G M ^a   Pearson, D ^a   Sanchez, M I ^a   Ito, H ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICALLY AMPLIFIED RESISTS; FILM DENSIFICATION; LATENT IMAGE FORMATION; POSTEXPOSURE BAKE;

AMPLIFICATION; CHEMICAL ANALYSIS; COPOLYMERS; DENSIFICATION; IMAGE QUALITY; MASS SPECTROMETRY; VAPORIZATION; VAPORS;

PHOTORESISTS;

EID: 0037167784     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0201332     Document Type: Article

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