Quarter- and subquarter-micron deep-UV lithography with chemically amplified positive resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 70-81

  Onishi, Yasunobu ^a   Sato, Kazuo ^a   Chiba, Kenzi ^a   Asano, Masafumi ^a   Niki, Hirokazu ^a   Hayase, Rumiko H ^a   Hayashi, Takao ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOLUTION; EXCIMER LASERS; PERFORMANCE; PHASE SHIFT; PHOTOLITHOGRAPHY; POLYMERS; ULTRAVIOLET RADIATION;

CHEMICALLY AMPLIFIED RESISTS; DEEP-ULTRAVIOLET RESISTS;

PHOTORESISTS;

EID: 0029727972     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241861     Document Type: Conference Paper

References (14)