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Journal of Physics D: Applied Physics

Volumn 45, Issue 37, 2012, Pages

Diffusive racetrack oxidation in a Ti sputter target by reactive high power impulse magnetron sputtering

(6) Audronis, M a,d Abrasonis, G b Munnik, F b Heller, R b Chapon, P c Bellido Gonzalez, V a

a Gencoa Ltd (United Kingdom)

b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH (Germany)

c HORIBA LTD (Japan)

d UNIVERSITY OF SHEFFIELD (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

BULK DIFFUSIONS; DEPTH PROFILE; DISCHARGE CONDITIONS; GLOW-DISCHARGE OPTICAL EMISSION SPECTROSCOPY; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); NEAR-SURFACE; NUCLEAR REACTION ANALYSIS; OXYGEN CONCENTRATIONS; OXYGEN PROFILES; SETPOINTS; TARGET STATE; TARGET SURFACE; TRANSITION REGIONS;

CHEMISORPTION; EMISSION SPECTROSCOPY; GLOW DISCHARGES; ION IMPLANTATION; MAGNETRON SPUTTERING; OXYGEN;

OXIDATION;

EID: 84865956051 PISSN: 00223727 EISSN: 13616463 Source Type: Journal
DOI: 10.1088/0022-3727/45/37/375203 Document Type: Article

Times cited : (13)

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