Deposition rate characteristics for steady state high power impulse magnetron sputtering (HIPIMS) discharges generated with a modulated pulsed power (MPP) generator

Thin Solid Films

Volumn 520, Issue 5, 2011, Pages 1559-1563

  Papa, F ^a   Gerdes, H ^b   Bandorf, R ^b   Ehiasarian, A P ^c   Kolev, I ^a   Braeuer, G ^b   Tietema, R ^a   Krug, T ^a  

^a Hauzer Techno Coating BV   (Netherlands)

^b FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^c SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

Author keywords

Chromium; Deposition rate; High power impulse magnetron sputtering; Highly ionized pulse plasma processes; HIPIMS; HIPP; Magnetic field; Modulated pulse power; MPP

Indexed keywords

HIGH-POWER; HIGHLY-IONIZED; HIPIMS; HIPP; MPP; PULSE POWER;

CHROMIUM; DEPOSITION RATES; IONIZATION; MAGNETIC FIELDS; MAGNETRON SPUTTERING; METAL IONS; POWER QUALITY;

PULSE GENERATORS;

EID: 82755197719     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.09.004     Document Type: Conference Paper

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