Investigation of reactive high power impulse magnetron sputtering processes using various target material-reactive gas combinations

Surface and Coatings Technology

Volumn 205, Issue 12, 2011, Pages 3613-3620

  Audronis, Martynas ^a   Bellido Gonzalez, Victor ^a  

^a Gencoa Ltd   (United Kingdom)

Author keywords

High power impulse magnetron sputtering; HIPIMS; Plasma optical emission monitoring; Process control; Reactive sputtering

Indexed keywords

ACTIVE FEEDBACK CONTROL; CHEMICAL AFFINITIES; COATINGS TECHNOLOGY; CONTROL TECHNOLOGIES; DC REACTIVE SPUTTERING; GAS FLOWS; GAS PLASMA; GAS SYSTEMS; HIGH POWER IMPULSE MAGNETRON SPUTTERING; HIGH-POWER; HIPIMS; HYSTERESIS BEHAVIOUR; MAGNETRON SPUTTERING PROCESS; POWER SUPPLY; REACTIVE GAS; STABLE OPERATION; TARGET MATERIALS;

ALUMINUM; BEHAVIORAL RESEARCH; CHROMIUM; DC POWER TRANSMISSION; ELECTRIC DISCHARGES; GAS EMISSIONS; HYSTERESIS; LIGHT EMISSION; MAGNETRON SPUTTERING; PLASMAS; REACTIVE SPUTTERING; TECHNOLOGY;

PROCESS CONTROL;

EID: 79951680693     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.12.038     Document Type: Article

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