-
1
-
-
36049053689
-
-
10.1103/PhysRev.168.107
-
R. T. C. Tsui, Phys. Rev. 168, 107 (1968). 10.1103/PhysRev.168.107
-
(1968)
Phys. Rev.
, vol.168
, pp. 107
-
-
Tsui, R.T.C.1
-
3
-
-
0032654285
-
-
10.1088/0963-0252/8/3/202
-
E. Kawamura, V. Vahedi, M. A. Lieberman, and C. K. Birdsall, Plasma Sources Sci. Technol. 8, R45 (1999). 10.1088/0963-0252/8/3/202
-
(1999)
Plasma Sources Sci. Technol.
, vol.8
, pp. 45
-
-
Kawamura, E.1
Vahedi, V.2
Lieberman, M.A.3
Birdsall, C.K.4
-
7
-
-
85047696531
-
-
10.1143/JJAP.20.893
-
N. Yabumoto, M. Oshima, O. Michikami, and S. Yoshi, Jpn. J. Appl. Phys. 20, 893 (1981). 10.1143/JJAP.20.893
-
(1981)
Jpn. J. Appl. Phys.
, vol.20
, pp. 893
-
-
Yabumoto, N.1
Oshima, M.2
Michikami, O.3
Yoshi, S.4
-
8
-
-
55149083507
-
-
10.1143/JJAP.47.5324
-
T. Ohchi, S. Kobayashi, M. Fukasawa, K. Kugimiya, and T. Kinoshita, Jpn. J. Appl. Phys. 47, 5324 (2008). 10.1143/JJAP.47.5324
-
(2008)
Jpn. J. Appl. Phys.
, vol.47
, pp. 5324
-
-
Ohchi, T.1
Kobayashi, S.2
Fukasawa, M.3
Kugimiya, K.4
Kinoshita, T.5
-
9
-
-
67650421492
-
-
10.1109/LED.2009.2022347
-
K. Eriguchi, A. Matsuda, Y. Nakakubo, M. Kamei, H. Ohta, and K. Ono, IEEE Electron Device Lett. 30, 712 (2009). 10.1109/LED.2009.2022347
-
(2009)
IEEE Electron Device Lett.
, vol.30
, pp. 712
-
-
Eriguchi, K.1
Matsuda, A.2
Nakakubo, Y.3
Kamei, M.4
Ohta, H.5
Ono, K.6
-
12
-
-
0001141656
-
-
10.1063/1.103171
-
T. Meguro, M. Hamagaki, S. Modaressi, T. Hara, Y. Aoyagi, M. Ishii, and Y. Yamamoto, Appl. Phys. Lett. 56, 1552 (1990). 10.1063/1.103171
-
(1990)
Appl. Phys. Lett.
, vol.56
, pp. 1552
-
-
Meguro, T.1
Hamagaki, M.2
Modaressi, S.3
Hara, T.4
Aoyagi, Y.5
Ishii, M.6
Yamamoto, Y.7
-
13
-
-
80053612131
-
-
10.1088/0963-0252/20/5/055001
-
H. Shin, W. Zhu, L. Xu, V. M. Donnelly, and D. J. Economou, Plasma Sources Sci. Technol. 20, 55001 (2011). 10.1088/0963-0252/20/5/055001
-
(2011)
Plasma Sources Sci. Technol.
, vol.20
, pp. 55001
-
-
Shin, H.1
Zhu, W.2
Xu, L.3
Donnelly, V.M.4
Economou, D.J.5
-
16
-
-
0030213902
-
-
10.1063/1.362977
-
J. R. Woodworth, M. E. Riley, D. C. Meister, B. P. Aragon, M. S. Le, and H. H. Sawin, J. Appl. Phys. 80, 1304 (1996). 10.1063/1.362977
-
(1996)
J. Appl. Phys.
, vol.80
, pp. 1304
-
-
Woodworth, J.R.1
Riley, M.E.2
Meister, D.C.3
Aragon, B.P.4
Le, M.S.5
Sawin, H.H.6
-
18
-
-
0000892949
-
-
10.1063/1.371447
-
M. V. Malyshev, V. M. Donnelly, J. I. Colonell, and S. Samukawa, J. Appl. Phys. 86, 4813 (1999). 10.1063/1.371447
-
(1999)
J. Appl. Phys.
, vol.86
, pp. 4813
-
-
Malyshev, M.V.1
Donnelly, V.M.2
Colonell, J.I.3
Samukawa, S.4
-
21
-
-
36149017288
-
-
10.1103/PhysRev.93.1136
-
M. A. Biondi, Phys. Rev. 93, 1136 (1954). 10.1103/PhysRev.93.1136
-
(1954)
Phys. Rev.
, vol.93
, pp. 1136
-
-
Biondi, M.A.1
-
23
-
-
0001081725
-
-
10.1103/PhysRev.88.362
-
R. N. Varney, Phys. Rev. 88, 362 (1952). 10.1103/PhysRev.88.362
-
(1952)
Phys. Rev.
, vol.88
, pp. 362
-
-
Varney, R.N.1
-
25
-
-
36749114996
-
-
10.1063/1.863332
-
K.-U. Riemann, Phys. Fluids 24, 2163 (1981). 10.1063/1.863332
-
(1981)
Phys. Fluids
, vol.24
, pp. 2163
-
-
Riemann, K.-U.1
-
26
-
-
84864185168
-
Ion energy distributions in pulsed inductively-coupled plasmas having a pulsed boundary electrode
-
Salt Lake City, UT, BAPS.2011.GEC.LW3.6
-
M. Logue, H. Shin, W. Zhu, L. Xu, V. M. Donnelly, D. J. Economou, and M. J. Kushner, Ion energy distributions in pulsed inductively-coupled plasmas having a pulsed boundary electrode., 64th Gaseous Electronics Conference, Salt Lake City, UT, BAPS.2011.GEC.LW3.6 (2011).
-
(2011)
64th Gaseous Electronics Conference
-
-
Logue, M.1
Shin, H.2
Zhu, W.3
Xu, L.4
Donnelly, V.M.5
Economou, D.J.6
Kushner, M.J.7
|