Film characterization of titanium oxide films prepared by high-power impulse magnetron sputtering

Surface and Coatings Technology

Volumn 206, Issue 5, 2011, Pages 967-971

  Jing, F J ^a   Yukimura, K ^a,b   Kato, H ^b   Lei, Y F ^a   You, T X ^a   Leng, Y X ^a   Huang, N ^a  

^a SOUTHWEST JIAOTONG UNIVERSITY   (China)

^b DOSHISHA UNIVERSITY   (Japan)

Author keywords

HIPIMS; HPPMS; HPPS; Magnetron sputtering; Pulsed glow; Titanium dioxide

Indexed keywords

ANATASE STRUCTURES; ARGON ION DENSITY; BACKGROUND GAS; DC POWER; EMERGING TECHNOLOGIES; FILM CHARACTERIZATIONS; GAS RATIO; GLOW PLASMAS; HIGH-POWER; HIPIMS; HPPMS; HPPS; MAIN STRUCTURE; METAL SPECIES; MIXED STRUCTURE; MIXTURE RATIO; OPTICAL EMISSION SPECTRA; PLASMA SPECIES; POWER DENSITIES; PRODUCTION RATES; PULSED GLOW; SURFACE CHARACTERISTICS; TITANIUM ATOMS; TITANIUM ION; XRD;

ARGON; DC POWER TRANSMISSION; DEPOSITION RATES; EMISSION SPECTROSCOPY; FILM PREPARATION; GLOW DISCHARGES; IONIZATION OF GASES; IONS; MAGNETRON SPUTTERING; OXIDE MINERALS; PLASMAS; SUBSTRATES; TITANIUM; TITANIUM DIOXIDE;

OXIDE FILMS;

EID: 80055113579     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.04.046     Document Type: Article

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