Ion flux-film structure relationship during magnetron sputtering of WO 3

EPJ Applied Physics

Volumn 56, Issue 2, 2011, Pages

  Hemberg, A ^a,b   Konstantinidis, S ^b   Renaux, F ^a   Dauchot, J P ^b   Snyders, R ^a,b  

^a MATERIA NOVA RESEARCH CENTER   (Belgium)

^b UNIVERSITY OF MONS   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AVERAGE ENERGY; GRAIN SIZE; ION ENERGY DISTRIBUTION FUNCTIONS; ION KINETIC ENERGY; ION POPULATION; IONIC CURRENT; MAGNETIC CONFIGURATION; MAGNETIC FIELD CONFIGURATIONS; MONOCLINIC PHASE; PHASE CONSTITUTION; PREFERENTIAL ORIENTATION; PULSED DC MAGNETRON SPUTTERING;

DISTRIBUTION FUNCTIONS; MAGNETIC FIELDS; MAGNETRON SPUTTERING; X RAY DIFFRACTION;

IONS;

EID: 80555123603     PISSN: 12860042     EISSN: 12860050     Source Type: Journal    
DOI: 10.1051/epjap/2011110200     Document Type: Article

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