Formation mechanism of SiGe nanorod arrays by combining nanosphere lithography and Au-assisted chemical etching

Nanoscale Research Letters

Volumn 7, Issue , 2012, Pages

  Lai, Chih Chung ^a   Lee, Yun Ju ^b   Yeh, Ping Hung ^b   Lee, Sheng Wei ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b TAMKANG UNIVERSITY   (Taiwan)

Author keywords

Ge; Nanorod; Nanosphere lithography; Self assembly

Indexed keywords

ANISOTROPIC ETCHING; CORROSION; GERMANIUM; GOLD ALLOYS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; LITHOGRAPHY; NANORODS; NANOSPHERES; REDOX REACTIONS; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; TEMPERATURE DISTRIBUTION;

CHEMICAL ETCHING; CORROSION REACTION; ETCHING TEMPERATURE; FORMATION MECHANISM; NANO SPHERE LITHOGRAPHY; SCANNING ELECTRONS; TEMPERATURE DEPENDENCE; TEMPERATURE SENSITIVE;

SI-GE ALLOYS;

SIGE;

EID: 84863236885     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-7-140     Document Type: Article

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