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Electrochemical and Solid-State Letters

Volumn 12, Issue 5, 2009, Pages

Arrayed sisige nanowire and heterostructure formations via au-assisted wet chemical etching method

(6) Wang, X a Pey, K L a,b Choi, W K a,c Ho, C K F a Fitzgerald, E a,d Antoniadis, D a,e

a SINGAPORE MIT ALLIANCE (Singapore)

b NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

c NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

d Massachusetts Institute of Technology Cambridge (United States)

e USA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALS; ELECTRIC WIRE; GERMANIUM; HETEROJUNCTIONS; WET ETCHING;

AS-GROWN FILMS; CHEMICAL COMPOSITIONS; DEVICE APPLICATIONS; GROWTH DIRECTIONS; HETEROSTRUCTURE; HETEROSTRUCTURES; LAYERED FILMS; NANOSPHERE LITHOGRAPHIES; ONE-DIMENSIONAL; WET-CHEMICAL ETCHINGS;

NANOWIRES;

EID: 62549104216 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.3093036 Document Type: Article

Times cited : (15)

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