The effect of substrate roughness on the static friction of CuO nanowires

Surface Science

Volumn 606, Issue 17-18, 2012, Pages 1393-1399

  Polyakov, Boris ^a,c   Vlassov, Sergei ^a   Dorogin, Leonid M ^a   Kulis, Peteris ^c   Kink, Ilmar ^a,b   Lohmus, Rynno ^a  

^a UNIVERSITY OF TARTU   (Estonia)

^b Estonian Nanotechnology Competence Centre   (Estonia)

^c UNIVERSITY OF LATVIA   (Latvia)

Author keywords

Adhesion; Copper oxide nanowires; In situ electron microscopy; Nanomanipulation; Nanotribology; Static friction; Surface roughness

Indexed keywords

AFM; ASPERITY MODEL; CHEMICAL ETCHING; CONTACT MECHANICS; ELASTIC BENDING; FRICTION MEASUREMENTS; IN-SITU ELECTRON MICROSCOPY; INTERFACIAL SHEAR STRENGTH; NANOMANIPULATIONS; REAL CONTACT AREA; STATIC FRICTION; STATIC FRICTION FORCE; SUBSTRATE ROUGHNESS;

ADHESION; ELECTRON MICROSCOPY; NANOTRIBOLOGY; NANOWIRES; SILICON WAFERS; SUBSTRATES; SURFACE ROUGHNESS; VAN DER WAALS FORCES;

STICTION;

EID: 84862650338     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2012.04.029     Document Type: Article

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