An investigation of the surface energy and optical transmittance of copper oxide thin films prepared by reactive magnetron sputtering

Acta Materialia

Volumn 53, Issue 19, 2005, Pages 5151-5159

  Ogwu, A A ^a   Bouquerel, E ^a,b   Ademosu, O ^a   Moh, S ^a   Crossan, E ^a   Placido, F ^a  

^a UNIVERSITY OF THE WEST OF SCOTLAND   (United Kingdom)

^b QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

Author keywords

Copper oxide; Optical transmittance; Surface energy; Thin films

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; COPPER OXIDES; DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; FILM PREPARATION; GLASS; HYDROPHOBICITY; INTERFACIAL ENERGY; MAGNETRON SPUTTERING; OPACITY; PROFILOMETRY; SCANNING ELECTRON MICROSCOPY; SPECTROPHOTOMETRY; SPUTTER DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

COPPER OXIDE FILMS; OPTICAL BANDGAP; REACTIVE MAGNETRON SPUTTERING; SURFACE ENERGY MEASUREMENTS;

THIN FILMS;

EID: 26644444290     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2005.07.035     Document Type: Article

References (22)

1. H. Derin, and K. Kantarli Appl Phys A 75 2002 391 395
2. Richardson TJ, Slack JL, Rubin MD. Electrochromism of copper oxide thin films. In: Presented at the 4th international meeting on electrochromism, August 21-23, 2000, Uppsala, Sweden.
3. J.F. Pierson, A. Thobor-Keck, and A. Billard Appl Surf Sci 210 2003 359 367
4. L. Kleiman, and K. Mudnick Phys Rev B 21 1980 1544
5. S. Ishizawa, T. Maruyama, and K. Akimoto Jpn J Appl Phys 39 2000 L786
6. R. Chandra, P. Taneja, and P. Ayuub Nanostruct Mater 11 4 1999 505 512
7. S.C. Ray Sol Energ Mater Sol Cells 68 2001 307
8. A. Paretta, M.K. Jayaraj, A. Di Nocera, S. Loreti, L. Quercia, and A. Agati Phys Status Solidi A 155 1996 399
9. T. Murayama Sol Energ Mater Sol Cells 56 1998 85
10. B. Balamurugan, and B.R. Mehta Thin Solid Films 396 2001 90
11. T.J. Richardson Solid State Ionics 165 2003 305 308
12. R.P. Schneider J Adhesion Sci Technol 11 1 1997 65 93
13. A.W. Neuman, R.J. Good, C.J. Hope, and M. Sejpal J Colloid Interf Sci 1974 291 304
14. F.M. Fowkes J Adhesion 4 1972 155 167
15. P.H. Owens, and R.C. Wendt J Appl Polym Sci 13 1969 1741 1747
16. C.J. van Oss, R.J. Good, and M.K. Chaudhry J Colloid Interf Sci 1986 378 390
17. S. Wu J Polym Sci 34 1971 19 30
18. R.H. Sunds Phys Rev 99 1955 1222
19. E.A. Davis, and N.F. Mott Philos Mag 22 1970 903
20. J. Tauc, R. Grigorovici, and A. Vancu Phys Status Solidi 15 1966 627
21. S.G. Wang, Q. Zhang, S.F. Yoon, J. Ahn, Q. Wang, and D.J. Yang Opt Mater 24 2003 509 514
22. M. Goto, A. Kasahara, T. Oishi, Y. Konishi, and M. Tosa J Appl Phys 94 3 2003 2110 2114