Structural origins of intrinsic stress in amorphous silicon thin films

Physical Review B - Condensed Matter and Materials Physics

Volumn 85, Issue 7, 2012, Pages

  Johlin, Eric ^a   Tabet, Nouar ^b   Castro Galnares, Sebastián ^a   Abdallah, Amir ^b   Bertoni, Mariana I ^a   Asafa, Tesleem ^b   Grossman, Jeffrey C ^a   Said, Syed ^b   Buonassisi, Tonio ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS   (Saudi Arabia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84857735301     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.85.075202     Document Type: Article

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