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Acta Physica Slovaca

Volumn 50, Issue 5, 2000, Pages 533-544

The effect of ions on the growth of amorphous and microcrystalline silicon

(1) Hamers, E A G a

a EINDHOVEN UNIVERSITY OF TECHNOLOGY (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0034343785 PISSN: 03230465 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (2)

References (22)

1
- 0001841364
- A. Matsuda, K. Nomoto, Y. Tacheuchi, A. Suzuki, A. Yuuki, J. Perrin: Surf. Sci. 227 (1990) 50
- (1990) Surf. Sci. , vol.227 , pp. 50
- Matsuda, A.¹ Nomoto, K.² Tacheuchi, Y.³ Suzuki, A.⁴ Yuuki, A.⁵ Perrin, J.⁶

2
- 0032094957
- E.A.G. Hamers, W.G.H.J.M. van Sark, J. Bezemer, H. Meiling, W.F. van der Weg: J. Non-Cryst. Solids 226 (1998) 205
- (1998) J. Non-cryst. Solids , vol.226 , pp. 205
- Hamers, E.A.G.¹ Van Sark, W.G.H.J.M.² Bezemer, J.³ Meiling, H.⁴ Van Der Weg, W.F.⁵

3
- 0000907524
- E.A.G. Hamers, J. Bezemer, W.F. van der Weg: Appl. Phys. Lett. 75 (1999) 609
- (1999) Appl. Phys. Lett. , vol.75 , pp. 609
- Hamers, E.A.G.¹ Bezemer, J.² Van Der Weg, W.F.³

4
- 0001322657
- E.A.G. Hamers, A. Fontcuberta i Morral, C. Niikura, R. Brenot, P. Roca i Cabarrocas: J. Appl. Phys. 88 (2000) 3674
- (2000) J. Appl. Phys. , vol.88 , pp. 3674
- Hamers, E.A.G.¹ Fontcuberta I Morral, A.² Niikura, C.³ Brenot, R.⁴ Roca I Cabarrocas, P.⁵

5
- 0001859896
- R. Glang, R.A. Holmwood, R.L. Rosenfeld: Rev. Sci. Instrum. 36 (1965) 7
- (1965) Rev. Sci. Instrum. , vol.36 , pp. 7
- Glang, R.¹ Holmwood, R.A.² Rosenfeld, R.L.³

6
- 0023421273
- H. Curtins, N. Wyrsch, M. Favre, A.V. Shah: Plasma Chem. Plasma Processing 7 (1987) 267
- (1987) Plasma Chem. Plasma Processing , vol.7 , pp. 267
- Curtins, H.¹ Wyrsch, N.² Favre, M.³ Shah, A.V.⁴

7
- 0030563489
- M. Heintze, R. Zedlitz: J. Non. Cryst. Solids 198-200 (1996) 1038
- (1996) J. Non. Cryst. Solids , vol.198-200 , pp. 1038
- Heintze, M.¹ Zedlitz, R.²

8
- 0001096326
- M. Fivaz, S. Brunner, W. Schwarzenbach, A.A. Howling, C. Hollenstein: Plasma Sources Sci. Technol. 4 (1995) 373
- (1995) Plasma Sources Sci. Technol. , vol.4 , pp. 373
- Fivaz, M.¹ Brunner, S.² Schwarzenbach, W.³ Howling, A.A.⁴ Hollenstein, C.⁵

9
- 0030549049
- W. Schwarzenbach, A.A. Howling, M. Fivaz, S. Brunner, Ch. Hollenstein: J. Vac. Sci. Technol. A 14 (1996) 132
- (1996) J. Vac. Sci. Technol. A , vol.14 , pp. 132
- Schwarzenbach, W.¹ Howling, A.A.² Fivaz, M.³ Brunner, S.⁴ Hollenstein, Ch.⁵

10
- 0001471348
- J.K. Olthoff, J. van Brunt, S.B. Radovanov, J.A. Rees, R. Surowiec: J. Appl. Phys. 75 (1994) 115
- (1994) J. Appl. Phys. , vol.75 , pp. 115
- Olthoff, J.K.¹ Van Brunt, J.² Radovanov, S.B.³ Rees, J.A.⁴ Surowiec, R.⁵

11
- 36549100807
- K. Köhler, J.W. Coburn, D.E. Horne, E. Kay, J.H. Keller: J. Appl. Phys. 57 (1985) 59
- (1985) J. Appl. Phys. , vol.57 , pp. 59
- Köhler, K.¹ Coburn, J.W.² Horne, D.E.³ Kay, E.⁴ Keller, J.H.⁵

12
- 84861237893
- J.L. Andújar, E. Bertran, A. Canillas, J.L. Morenza: J. Vac. Sci. Technol. A 9 (1991) 2216
- (1991) J. Vac. Sci. Technol. A , vol.9 , pp. 2216
- Andújar, J.L.¹ Bertran, E.² Canillas, A.³ Morenza, J.L.⁴

13
- 0031334268
- H. Meiling, J. Bezemer, R.E.I. Schropp, W.F. van der Weg: in Amorphous and Microcrystalline Silicon Technology 1997, Mat. Res. Soc. Symp. Proc. 467 (1997) 459
- (1997) Amorphous and Microcrystalline Silicon Technology 1997, Mat. Res. Soc. Symp. Proc. , vol.467 , pp. 459
- Meiling, H.¹ Bezemer, J.² Schropp, R.E.I.³ Van Der Weg, W.F.⁴

14
- 0022080350
- S. Nishikawa, H. Kakinuma, T. Watanabe, K. Nihei: Jpn. J. Appl. Phys. 24 (1985) 639
- (1985) Jpn. J. Appl. Phys. , vol.24 , pp. 639
- Nishikawa, S.¹ Kakinuma, H.² Watanabe, T.³ Nihei, K.⁴

15
- 0019637014
- J.E. Potts, E.M. Peterson, J.A. McMillan: J. Appl. Phys. 52 (1981) 6665
- (1981) J. Appl. Phys. , vol.52 , pp. 6665
- Potts, J.E.¹ Peterson, E.M.² McMillan, J.A.³

16
- 0002028746
- edited by Y. Pauleau, Kluwer Academic Publishers, Dordrecht, Chap.9
- J.K. Hirvonen: in Materials and Processes for Surface and Interface Engineering, edited by Y. Pauleau, Kluwer Academic Publishers, Dordrecht, 1995, Chap.9, pp. 307-346
- (1995) Materials and Processes for Surface and Interface Engineering , pp. 307-346
- Hirvonen, J.K.¹

17
- 0032675570
- Ch. Hollenstein, A.A. Howling, C. Courteille, J.-L. Dorier, L. Sansonnens, D. Magni, H. Müller: in Amorphous and Microcrystalline Silicon Technology 1998, Mat. Res. Soc. Symp. Proc. 507 (1998) 547
- (1998) Amorphous and Microcrystalline Silicon Technology 1998, Mat. Res. Soc. Symp. Proc. , vol.507 , pp. 547
- Hollenstein, Ch.¹ Howling, A.A.² Courteille, C.³ Dorier, J.-L.⁴ Sansonnens, L.⁵ Magni, D.⁶ Müller, H.⁷

18
- 0000232468
- W.M.M. Kessels, C.M. Leeuwis, M.C.M. van de Sanden, D.C. Schram: J. Appl. Phys. 86 (1999) 4029
- (1999) J. Appl. Phys. , vol.86 , pp. 4029
- Kessels, W.M.M.¹ Leeuwis, C.M.² Van De Sanden, M.C.M.³ Schram, D.C.⁴

19
- 0002007943
- M.T. Swihart, S.L. Girshick: J. Phys. Chem. B 103 (1999) 64
- (1999) J. Phys. Chem. B , vol.103 , pp. 64
- Swihart, M.T.¹ Girshick, S.L.²

20
- 0012225405
- P. Kae-Nune, J. Perrin, J. Guillon, J. Jolly: Plasma Sources Sci Technol. 4 (1995) 250
- (1995) Plasma Sources Sci Technol. , vol.4 , pp. 250
- Kae-Nune, P.¹ Perrin, J.² Guillon, J.³ Jolly, J.⁴

21
- 0032351436
- J. Perrin, M. Shiratani, P. Kae-Nune, H. Videlot, J. Jolly, J. Guillon: J. Vac. Sci. Technol. A 16 (1998) 278
- (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 278
- Perrin, J.¹ Shiratani, M.² Kae-Nune, P.³ Videlot, H.⁴ Jolly, J.⁵ Guillon, J.⁶

22
- 0001883643
- J. Perrin, O. Leroy, M.C. Bordage: Contrib. Plasma Phys. 36 (1996) 3
- (1996) Contrib. Plasma Phys. , vol.36 , pp. 3
- Perrin, J.¹ Leroy, O.² Bordage, M.C.³

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