Effect of UV irradiation on modification and subsequent wet removal of model and post-etch fluorocarbon residues

Journal of the Electrochemical Society

Volumn 159, Issue 3, 2012, Pages

  Le, Q T ^a   De Marneffe, J F ^a   Conard, T ^a   Vaesen, I ^a   Struyf, H ^a   Vereecke, G ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE RESOLVED X RAY PHOTOELECTRON SPECTROSCOPY; FLUOROCARBON POLYMERS; FLUOROCARBON RESIDUES; LOW K DIELECTRICS; MONOETHANOLAMINE; PATTERNED DIELECTRIC; POLYMER BACKBONES; POLYMER REMOVAL; POLYMER RESIDUE; POLYMER STRUCTURE; SOLVENT MIXTURES; UV IRRADIATION; WET-CLEANS;

DIELECTRIC MATERIALS; FLUORINE CONTAINING POLYMERS; FLUOROCARBONS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MIXTURES; TITANIUM NITRIDE; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

POLYMERS;

EID: 84857392551     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/2.008203jes     Document Type: Article

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