Photoresist and etch residue removal: Effect of surface energy and interfacial tension

Journal of the Electrochemical Society

Volumn 153, Issue 7, 2006, Pages

  Levitin, Galit ^a   Timmons, Christopher ^a,b   Hess, Dennis W ^a  

^a Georgia Institute of Technology   (United States)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; CROSSLINKING; ETCHING; INTEGRATED CIRCUITS; MICROELECTRONICS; MIXTURES; PHOTORESISTS; SUBSTRATES; SURFACE TENSION;

CLEANING EFFICIENCY; PATTERNED FLUOROCARBON RESIDUES; SEPARATION ENERGY;

INTERFACIAL ENERGY;

EID: 33744812750     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2203096     Document Type: Article

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