Electrochemical cleaning of post-plasma etch fluorocarbon residues using reductive radical anion chemistry

Electrochemical and Solid-State Letters

Volumn 7, Issue 12, 2004, Pages

  Timmons, Christopher L ^a   Hess, Dennis W ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; ELECTROCHEMISTRY; FLUOROCARBONS; FREE RADICALS; NEGATIVE IONS; ORGANIC POLYMERS; PLASMA ETCHING; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTROCHEMICAL CLEANING; POST-PLASMA ETCH FLUOROCARBON; RADICAL ANION CHEMISTRY;

ELECTROLYTIC CLEANING;

EID: 10944256317     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1813211     Document Type: Article

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