Multiple-height microstructure fabricated by deep reactive ion etching and selective ashing of resist layer combined with ultraviolet curing

Japanese Journal of Applied Physics

Volumn 51, Issue 1 PART 2, 2012, Pages

  Kumagai, Shinya ^a   Hikita, Akiyoshi ^a   Iwamoto, Takuya ^a   Tomikawa, Takashi ^a   Hori, Masaru ^b   Sasaki, Minoru ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEEP REACTIVE ION ETCHING; ETCHING DEPTH; LASER DISPLAY; MATERIAL PROPERTY; MICRO MIRROR; RESIST LAYERS; RESIST PATTERN; ROTATIONAL SPRING; ULTRAVIOLET CURING; UV EXPOSURE; UV-CURING;

MICROSTRUCTURE; NATURAL FREQUENCIES; PHOTORESISTS;

CURING;

EID: 84857208580     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.51.01AB04     Document Type: Conference Paper

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