Atomic vapor deposition approach to In 2O 3 thin films

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 9, 2011, Pages 8094-8100

  Hellwig, Malte ^a   Parala, Harish ^a   Cybinksa, Joanna ^a,d   Barreca, Davide ^b   Gasparotto, Alberto ^b   Niermann, Benedikt ^a   Becker, Hans Werner ^a   Rogalla, Detlef ^a   Feydt, Jürgen ^c   Irsen, Stephan ^c   Mudring, Anja Verena ^a   Winter, Jörg ^a   Fischer, Roland A ^a   Devi, Anjana ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b UNIVERSITY OF PADOVA   (Italy)

^c CENTER OF ADVANCED EUROPEAN STUDIES AND RESEARCH CAESAR   (Germany)

^d UNIVERSITY OF WROC AW   (Poland)

Author keywords

AVD; Composition; In 2O 3; Morphology; Thin films

Indexed keywords

ATOMIC VAPOR DEPOSITION; AVD; CUBIC PHASE; FILM MORPHOLOGY; GLASS SUBSTRATES; MORPHOLOGY AND COMPOSITION; OXYGEN ATMOSPHERE; PHOTOLUMINESCENCE MEASUREMENTS; PROCESSING CONDITION; RUTHERFORD BACKSCATTERING SPECTROMETRY; SI(1 0 0); SPECTRAL REGION; SUBSTRATE TEMPERATURE; TEMPERATURE RANGE; X-RAY PHOTOELECTRONS;

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; CHEMICAL ANALYSIS; INDIUM; MORPHOLOGY; OPTICAL PROPERTIES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; X RAY DIFFRACTION;

THIN FILMS;

EID: 84856849320     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.5024     Document Type: Conference Paper

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