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Applied Surface Science

Volumn 256, Issue 23, 2010, Pages 7091-7095

Growth dynamics of pulsed laser deposited indium oxide thin films: A substrate dependent study

(4) Tripathi, Neeti a Rath, Shyama a Ganesan, V b Choudhary, R J b

a UNIVERSITY OF DELHI (India)

b UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH (India)

Author keywords

AFM; Indium oxide; Power spectral density; Pulsed laser deposition; Raman spectroscopy; XRD

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; ENERGY GAP; GALLIUM ARSENIDE; GLASS; III-V SEMICONDUCTORS; INDIUM COMPOUNDS; POWER SPECTRAL DENSITY; PULSED LASER DEPOSITION; PULSED LASERS; QUARTZ; RAMAN SPECTROSCOPY; SEMICONDUCTING GALLIUM; SPECTRAL DENSITY; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

CRYSTALLINE SUBSTRATES; HIGH RESOLUTION X RAY DIFFRACTION; INDIUM OXIDE; INDIUM OXIDE THIN FILMS; INTERFACE CHARACTERISTIC; LINEAR DIFFUSION MODELS; POWER SPECTRAL DENSITY ANALYSIS; PREFERRED ORIENTATIONS;

OXIDE FILMS;

EID: 77955307180 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2010.05.033 Document Type: Article

Times cited : (24)

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