Novel type of indium oxide thin films sputtering for opto-electronic applications

Applied Surface Science

Volumn 253, Issue 15, 2007, Pages 6608-6611

  Golan, G ^a   Axelevitch, A ^a   Gorenstein, B ^a   Peled, A ^a  

^a HOLON INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

Hot probe evaluation; Indium oxide; Plane plasma sputtering

Indexed keywords

DOPING (ADDITIVES); INDIUM COMPOUNDS; MAGNETRON SPUTTERING; OPTOELECTRONIC DEVICES; SPUTTER DEPOSITION;

HOT-PROBE EVALUATION; INDIUM OXIDE; PLANE PLASMA SPUTTERING; PLASMA DISCHARGE;

THIN FILMS;

EID: 34247648018     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.01.030     Document Type: Article

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